公开(公告)号：US20220035237A1

公开(公告)日：2022-02-03

申请号：US17245947

申请日：2021-04-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Soo Yong LEE ,  Min-Cheol KANG ,  U Seong KIM ,  Seung Hune YANG ,  Jee Yong LEE

IPC: G03F1/36 ,  G03F1/76 ,  G06T7/00 ,  G06T3/40

Abstract: A process proximity correction method is performed by a process proximity correction computing device which performs a process proximity correction (PPC) through at least one of a plurality of processors. The process proximity correction method includes: converting a target layout including a plurality of patterns into an image, zooming-in or zooming-out the image at a plurality of magnifications to generate a plurality of input channels, receiving the plurality of input channels and performing machine learning to predict an after-cleaning image (ACI), comparing the predicted after-cleaning image with a target value to generate an after-cleaning image error, and adjusting the target layout on the basis of the after-cleaning image error.