SEMICONDUCTOR DEVICE, LAYOUT DESIGN METHOD FOR THE SAME AND METHOD FOR FABRICATING THE SAME

    公开(公告)号:US20220223523A1

    公开(公告)日:2022-07-14

    申请号:US17449721

    申请日:2021-10-01

    Abstract: A semiconductor device, a layout design method for the semiconductor device, and a method for fabricating the semiconductor device are provided. The semiconductor device includes a standard cell region. The semiconductor device includes a substrate including a first surface and a second surface, which are opposite to each other, a first power wiring, which extends in a first direction on the first surface of the substrate, and is configured to provide a first power voltage to the standard cell region, a second power wiring, which extends in the first direction on the first surface of the substrate, is arranged alternately with the first power wiring in a second direction intersecting the first direction, and is configured to provide a second power voltage different from the first power voltage to the standard cell region, a first back routing wiring on the second surface of the substrate, and a plurality of first tab cell regions arranged along the second direction, wherein each of the first tab cell regions includes a first through via, which penetrates the substrate and connects the first power wiring and the first back routing wiring.

    Semiconductor device, layout design method for the same and method for fabricating the same

    公开(公告)号:US12068251B2

    公开(公告)日:2024-08-20

    申请号:US17449721

    申请日:2021-10-01

    CPC classification number: H01L23/5286 H01L23/481 H01L27/092 H01L27/0924

    Abstract: A semiconductor device, a layout design method for the semiconductor device, and a method for fabricating the semiconductor device are provided. The semiconductor device includes a standard cell region. The semiconductor device includes a substrate including a first surface and a second surface, which are opposite to each other, a first power wiring, which extends in a first direction on the first surface of the substrate, and is configured to provide a first power voltage to the standard cell region, a second power wiring, which extends in the first direction on the first surface of the substrate, is arranged alternately with the first power wiring in a second direction intersecting the first direction, and is configured to provide a second power voltage different from the first power voltage to the standard cell region, a first back routing wiring on the second surface of the substrate, and a plurality of first tab cell regions arranged along the second direction, wherein each of the first tab cell regions includes a first through via, which penetrates the substrate and connects the first power wiring and the first back routing wiring.

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