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公开(公告)号:US20220068728A1
公开(公告)日:2022-03-03
申请号:US17212914
申请日:2021-03-25
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jitae PARK , YOUNGJOO LEE , TAEKYUN KANG , DOO YOUNG GWAK , Aekyung KIM , HYOWON BAE , KYUNGGON YOU , Seongjin IN , Sang Yoon HAN
Abstract: Disclosed are a method of monitoring a semiconductor device fabrication process and a method of fabricating a semiconductor device using the same. The monitoring method may include determining a normalization range of a target byproduct, which is a measurement target of byproducts produced in a chamber by an etching process, the byproducts including the target byproduct and a non-target byproduct, the target byproduct including first and second target byproducts, which are respectively produced by and before the etching process on a to-be-processed layer, obtaining a first index from a ratio of the target byproduct to the non-target byproduct, obtaining a second index by subtracting an emission intensity of the second target byproduct from the first index, obtaining a third index by integrating the second index on a time interval, and estimating a result of the etching process and presence or absence of a failure, based on the third index.
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公开(公告)号:US20240274419A1
公开(公告)日:2024-08-15
申请号:US18529011
申请日:2023-12-05
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Kwangho LEE , Sangki NAM , Jitae PARK , Seongjin IN , Keonhee LIM , Sungho JANG
IPC: H01J37/32
CPC classification number: H01J37/32972 , H01J37/32926
Abstract: A plasma monitoring system includes a chamber with an internal space configured to perform a plasma process on a semiconductor substrate, the chamber including a view window and a substrate stage, a light transmitter on the view window and including optical fibers configured to obtain a first light generated during the plasma process, a detachable reflection mirror between the view window and the optical fibers, a light generator configured to irradiate a second light onto the reflection mirror through the optical fibers and to irradiate a third light onto the view window through the optical fibers, and a light analyzer configured to obtain a light spectrum from the first light, to correct the light spectrum based on the second light reflected from the reflection mirror, and to correct the light spectrum based on the third light reflected from the view window.
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