公开(公告)号：US20170237150A1

公开(公告)日：2017-08-17

申请号：US15427429

申请日：2017-02-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minho SOH ,  Sangmin JUNG ,  Gwangun OH

IPC: H01Q1/24 ,  H01Q1/38 ,  H01Q5/30

CPC classification number: H01Q1/243 ,  H01Q5/35 ,  H01Q5/371 ,  H01Q5/385 ,  H01Q9/42 ,  H01Q21/28

Abstract: An electronic device including an antenna is provided. The electronic device includes a housing, a radio frequency (RF) circuit located within the housing and configured to output a first RF signal and a second RF signal, at least one processor located within the housing and configured to electrically connect to the RF circuit, a first radiating body electrically connected to the RF circuit, a second radiating body electrically connected to the first radiating body, and an RF switch located within the housing and electrically connected to the processor and the second radiating body, wherein the at least one processor is further configured to control the RF switch to emit at least one of the first RF signal and the second RF signal output from the RF circuit to at least one of the first radiating body and the second radiating body.

公开(公告)号：US20240320814A1

公开(公告)日：2024-09-26

申请号：US18432450

申请日：2024-02-05

Applicant: Samsung Electronics Co., Ltd.

Inventor： Bongju LEE ,  Sangmin JUNG ,  Seunghwan YOO ,  Raehong YOUN ,  Namhoon LEE

IPC: G06T7/00 ,  G06T3/403 ,  G06T5/40 ,  G06T5/92 ,  G06T7/13 ,  G06T7/136 ,  G06T7/60 ,  H01L21/67

CPC classification number: G06T7/0004 ,  G06T3/403 ,  G06T5/40 ,  G06T5/92 ,  G06T7/13 ,  G06T7/136 ,  G06T7/60 ,  H01L21/67288 ,  G06T2207/20036 ,  G06T2207/20132 ,  G06T2207/30148

Abstract: A defect inspection or reduction apparatus includes a chamber moving a substrate and having an inner space therein, a laser oscillation structure irradiating a laser beam to a processing area of the substrate, a mask positioned in the laser oscillation structure and processing the laser beam, a beam profiler obtaining a beam image for the laser beam passing through the mask, and a damage detector detecting a defect area of the mask and the laser beam from the beam image. The damage detector includes an image pre-processing department performing a pre-processing on the beam image that is obtained from the beam profiler, an image extraction department extracting a defect area of the beam image on which the pre-processing is performed, and an image detector detecting a defect of the beam image based on the defect area.