公开(公告)号：US20150255276A1

公开(公告)日：2015-09-10

申请号：US14611691

申请日：2015-02-02

Applicant: Samsung Electronics Co., Ltd.

Inventor： Youn-Joung CHO ,  Youn-Soo KIM ,  Sang-Jun YIM ,  Myong-Woon KIM ,  Sang-Ick LEE ,  Sang-Chul YOUN

IPC: H01L21/02 ,  H01L23/00 ,  C07F7/00

CPC classification number: H01L21/0228 ,  C07F7/003 ,  C23C16/405 ,  C23C16/45553 ,  H01L21/02189 ,  H01L23/291 ,  H01L23/3171 ,  H01L28/40 ,  H01L2924/0002 ,  H01L2924/00

Abstract: An organometallic precursor is represented by a chemical formula of Xn(M)(R1)m(R2)k. M is a central metal. X is a ligand of M and one of 6,6-dimethylfulvenyl, indenyl, cyclopentadienyl and cyclopentadienyl substituted with an amino group. R1 and R2 are ligands of M, and each independently an amino group or an ethylenediamino group. Each n, m and k is a positive integer, and a sum of n, m and k is equal to 3 or 4.

Abstract translation: 有机金属前体由Xn（M）（R1）m（R2）k的化学式表示。 M是中心金属。 X是M的配位体，被氨基取代的6,6-二甲基富维甲基，茚基，环戊二烯基和环戊二烯基中的一个。 R1和R2是M的配体，并且各自独立地是氨基或乙二胺基。 每个n，m和k是正整数，n，m和k的和等于3或4。