公开(公告)号：US20190139796A1

公开(公告)日：2019-05-09

申请号：US15956192

申请日：2018-04-18

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sang-kil LEE ,  Sung-yoon RYU ,  Hyun LEE ,  Yu-sin YANG ,  Q-han PARK

IPC: H01L21/67 ,  H01L21/66

Abstract: An apparatus for manufacturing a semiconductor device is provided. The apparatus for manufacturing a semiconductor device may include a mass flow controller configured to control a flow of a process gas supplied to a process chamber, the mass flow controller configured to adjust an outflow rate of the process gas exiting the mass flow controller in response to a correction signal, the correction signal generated based on a difference between an inflow rate of the process gas flowing into the mass flow controller and a reference flow rate, a sensor configured to measure a chamber pressure inside the process chamber, an exhaust valve configured to adjust an exhaust speed of an exhaust gas exhausted from the process chamber; and a monitoring apparatus configured to detect a defect of the mass flow controller based on the correction signal, the chamber pressure, and the exhaust speed of the exhaust valve.