公开(公告)号：US20240060185A1

公开(公告)日：2024-02-22

申请号：US18231400

申请日：2023-08-08

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yeontae KIM ,  Yihwan KIM ,  Hunyong PARK ,  Keesoo PARK ,  Janghwi LEE ,  Sungho JANG

IPC: C23C16/48 ,  C23C16/458

CPC classification number: C23C16/482 ,  C23C16/4585

Abstract: A substrate processing apparatus includes a chamber including a susceptor to support a substrate, a reflective housing outside the chamber, a light source in the reflective housing, the light source being configured to emit a light toward the susceptor, and a light adjuster between the light source and the susceptor, the light adjuster including a support portion supported inside the chamber and a lens coupled to the support portion, and the lens including a transmission portion configured to transmit the light and a scattering pattern portion configured to scatter the light.

公开(公告)号：US20210384012A1

公开(公告)日：2021-12-09

申请号：US17173702

申请日：2021-02-11

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jinhyuk CHOI ,  Siqing LU ,  Sangki NAM ,  Keesoo PARK ,  Soonam PARK

IPC: H01J37/32

Abstract: A substrate processing apparatus includes a chamber housing with an upper portion opened, the chamber housing defining a reaction space, a susceptor configured to support a substrate in the chamber housing, and a dielectric cover covering an upper portion of the chamber housing. The dielectric cover includes a dielectric lid, and a mode modifying assembly arranged around the dielectric lid to be spaced apart from the dielectric lid, the mode modifying assembly configured to adjust a distance from the dielectric lid.