公开(公告)号：US20180144995A1

公开(公告)日：2018-05-24

申请号：US15702870

申请日：2017-09-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Young-Duk Kim ,  Byeong-Hwan Jeon ,  Kyung-Sik Kang ,  Kang-Woong Ko ,  Soo-Ryong Kim ,  Tae-Joong Kim ,  Jun-Bum Park ,  Gil-Woo Song ,  Sung-Ho Jang ,  Hyoung-Jo Jeon ,  Jae-Chol Joo

IPC: H01L21/66 ,  H01L21/78 ,  G01B11/06 ,  G01B11/02 ,  G01N21/88 ,  G01N21/95

CPC classification number: H01L22/12 ,  G01B11/022 ,  G01B11/06 ,  G01B11/0633 ,  G01B2210/56 ,  G01N21/8806 ,  G01N21/9501 ,  G01N2021/8845 ,  G01N2021/8848 ,  H01L21/78

Abstract: An optical inspection apparatus includes a broadband light source, a monochromator, an image obtaining apparatus, and an analysis device. The monochromator is configured to convert light from the broadband light source into a plurality of monochromatic beams of different wavelengths and sequentially output the monochromatic beams, where each beam has a preset wavelength width and corresponds to one of a plurality of different wavelength regions. The image obtaining apparatus is configured to allow each monochromatic beam output from the monochromator to be incident to a top surface of an inspection target without using a beam splitter, allow light reflected by the inspection target to travel in a form of light of an infinite light source, and generate 2D images of the inspection target. The analysis device is configured to analyze the 2D images of the inspection target in the plurality of wavelength regions.

公开(公告)号：US20250035564A1

公开(公告)日：2025-01-30

申请号：US18441476

申请日：2024-02-14

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Sung-Il Choi ,  Byeongkwan Song ,  Chulmoo Kang ,  Kang-Woong Ko ,  Kyungbeom Kim ,  Mira Park ,  Yongseok Won ,  Younsub Lee ,  Jeonghoo Jo

IPC: H01L21/66 ,  G06T7/00 ,  G06T7/13

Abstract: The present disclosure relates to substrate test methods. An example substrate test method comprises loading a substrate into a substrate test apparatus and testing the substrate in the substrate test apparatus. The step of testing the substrate includes testing a first region of the substrate, and testing a second region of the substrate after testing the first region. The step of testing the first region includes determining that the first region is aligned and irradiating light to the first region. The step of testing the second region includes determining that the second region is aligned and irradiating light to the second region.

公开(公告)号：US20170200658A1

公开(公告)日：2017-07-13

申请号：US15366964

申请日：2016-12-01

Applicant: Samsung Electronics Co., Ltd.

Inventor： Yusin Yang ,  Kang-Woong Ko ,  Sung Yoon Ryu ,  Gil-Woo Song ,  Sangkil Lee ,  Chungsam Jun ,  HyoungJo Jeon ,  Masahiro Horie

IPC: H01L21/66 ,  G01N21/27 ,  G01N21/95

Abstract: A method of inspecting a substrate includes irradiating light onto a substrate that has experienced a first process, obtaining spectral data of the light reflected from the substrate, detecting a defect region of the substrate from the spectral data, and extracting a first defect site that occurred in or during the first process from the defect region. Extracting the first defect site includes establishing an effective area where the first process affects the substrate, and extracting a superimposed area that is overlapped with the effective area from the defect region. The superimposed area is defined as the first defect site.