公开(公告)号：USD757699S1

公开(公告)日：2016-05-31

申请号：US29507314

申请日：2014-10-27

Applicant: Samsung Electronics Co., Ltd.

Designer： Changwoo Lee ,  Jooho Kim ,  Junsung Chung

公开(公告)号：US11740073B2

公开(公告)日：2023-08-29

申请号：US17463499

申请日：2021-08-31

Applicant: SAMSUNG ELECTRONICS CO., LTD. ,  SEOUL NATIONAL UNIVERSITY R&DB FOUNDATION

Inventor： Jooho Kim ,  Donyun Kim ,  Yunhyoung Nam ,  Seungjin Lee ,  Dawoon Choi

IPC: G01B11/24 ,  H01J37/28 ,  G06T7/60 ,  G06V10/26

CPC classification number: G01B11/24 ,  G06T7/60 ,  G06V10/267 ,  H01J37/28 ,  H01J2237/24578 ,  H01J2237/2803

Abstract: A method of measuring a critical dimension (CD) includes forming a plurality of patterns in a substrate, creating first to n-th images, where n is a natural number greater than 1, for first to n-th areas in the substrate, respectively, where the first to n-th areas do not overlap with each other, where each of the first to n-th areas comprising at least some of the plurality of patterns, creating a merged image for the first to n-th images, and measuring a CD for a measurement object from the plurality of patterns using the merged image. The merged image has a higher resolution than each of the first to n-th images.

公开(公告)号：USD761777S1

公开(公告)日：2016-07-19

申请号：US29507308

申请日：2014-10-27

Applicant: Samsung Electronics Co., Ltd.

Designer： Changwoo Lee ,  Jooho Kim ,  Junsung Chung