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公开(公告)号:US10211196B2
公开(公告)日:2019-02-19
申请号:US15234532
申请日:2016-08-11
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor: Jae-Hyok Ko , Min-Chang Ko , Han-Gu Kim , Jong-Kyu Song , Jin Heo
Abstract: An electrostatic discharge (ESD) protection device includes an N-type laterally diffused metal oxide semiconductor (LDMOS) transistor including a source electrode, a gate electrode, and a well bias electrode that are connected to a first pad receiving a first voltage, and a drain electrode connected to a middle node. The ESD protection device further includes a silicon controlled rectifier (SCR) connected between the middle node and a second pad receiving a second voltage higher than the first voltage.
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公开(公告)号:US09799641B2
公开(公告)日:2017-10-24
申请号:US14809299
申请日:2015-07-27
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jae-Hyok Ko , Han-Gu Kim , Jong-Kyu Song , Jin Heo
IPC: H01L27/02
CPC classification number: H01L27/0262 , H01L27/027
Abstract: In an ESD protection device, a first well of a first conductivity type and a second well of a second conductivity type are formed in a substrate to contact each other. A first impurity region of the first conductivity type and a second impurity region of the second conductivity type are formed in the first well, and are electrically connected to a first electrode pad. The second impurity region is spaced apart from the first impurity region in a direction of the second well. A third impurity region is formed in the second well, has the second conductivity type, and is electrically connected to a second electrode pad. A fourth impurity region is formed in the second well, is located in a direction of the first well from the third impurity region to contact the third impurity region, has the first conductivity type, and is electrically floated.
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公开(公告)号:US10134723B2
公开(公告)日:2018-11-20
申请号:US15708452
申请日:2017-09-19
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jae-Hyok Ko , Han-Gu Kim , Jong-Kyu Song , Jin Heo
IPC: H01L27/02
Abstract: In an ESD protection device, a first well of a first conductivity type and a second well of a second conductivity type are formed in a substrate to contact each other. A first impurity region of the first conductivity type and a second impurity region of the second conductivity type are formed in the first well, and are electrically connected to a first electrode pad. The second impurity region is spaced apart from the first impurity region in a direction of the second well. A third impurity region is formed in the second well, has the second conductivity type, and is electrically connected to a second electrode pad. A fourth impurity region is formed in the second well, is located in a direction of the first well from the third impurity region to contact the third impurity region, has the first conductivity type, and is electrically floated.
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公开(公告)号:US20180012883A1
公开(公告)日:2018-01-11
申请号:US15708452
申请日:2017-09-19
Applicant: Samsung Electronics Co., Ltd.
Inventor: Jae-Hyok Ko , Han-Gu Kim , Jong-Kyu Song , Jin Heo
IPC: H01L27/02
CPC classification number: H01L27/0262 , H01L27/027
Abstract: In an ESD protection device, a first well of a first conductivity type and a second well of a second conductivity type are formed in a substrate to contact each other. A first impurity region of the first conductivity type and a second impurity region of the second conductivity type are formed in the first well, and are electrically connected to a first electrode pad. The second impurity region is spaced apart from the first impurity region in a direction of the second well. A third impurity region is formed in the second well, has the second conductivity type, and is electrically connected to a second electrode pad. A fourth impurity region is formed in the second well, is located in a direction of the first well from the third impurity region to contact the third impurity region, has the first conductivity type, and is electrically floated.
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