SEMICONDUCTOR DEVICE
    1.
    发明申请

    公开(公告)号:US20240421082A1

    公开(公告)日:2024-12-19

    申请号:US18662042

    申请日:2024-05-13

    Abstract: A semiconductor device includes a substrate including a standard cell area and an ending cell area that at least partially surrounds the standard cell area; a first active pattern in the standard cell area; a first wiring that extends in a first direction and is on the first active pattern; a first gate electrode that extends in a second direction and is on the first active pattern; a first gate contact; a second active pattern in the ending cell area; a second wiring that extends in the first direction and is on the second active pattern; a second gate electrode that extends in the second direction and is on the second active pattern; and a second gate contact.

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