公开(公告)号：US20230220213A1

公开(公告)日：2023-07-13

申请号：US18145142

申请日：2022-12-22

Applicant: Samsung Electronics Co., Ltd.

Inventor： JAE WOON KIM ,  Seung-min Ryu ,  Haruyoshi Sato ,  Kazuya Saito ,  Masayuki Kimura ,  Takahiro Yoshii ,  Tsubasa Shiratori ,  Min Jae Sung ,  Gyu-Hee Park ,  Youn Joung Cho

IPC: C09D1/00 ,  C07F3/00 ,  H10B12/00

CPC classification number: C09D1/00 ,  C07F3/003 ,  H10B12/033

Abstract: Compositions for manufacturing a thin film are provided. The compositions may include a compound having a structure of Chemical Formula 1:




M may be strontium (Sr) or barium (Ba), X1 and X2 may each independently be oxygen (O) or a substituted or unsubstituted alkylamino group having 1 to 5 carbon atoms, R1 and R2 may each independently be a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms or a substituted or unsubstituted perfluoro alkyl group having 1 to 5 carbon atoms, R3 may be hydrogen or a substituted or unsubstituted alkyl group having 1 to 5 carbon atoms, L may be a substituted or unsubstituted polyether having 1 to 6 oxygen atoms, or a substituted or unsubstituted polyamine having 1 to 6 nitrogen atoms, or a substituted or unsubstituted polyetheramine having 1 to 6 oxygen atoms or nitrogen atoms, and n may be an integer of 1 to 6.