SUBSTRATE SUPPORTING APPARATUS
    1.
    发明公开

    公开(公告)号:US20240079264A1

    公开(公告)日:2024-03-07

    申请号:US18235603

    申请日:2023-08-18

    CPC classification number: H01L21/68742 H01L21/67288 H01L21/68785

    Abstract: A substrate supporting apparatus includes a stage table configured to support a substrate and including a plurality of openings, a plurality of lift pins disposed to be vertically movable through the plurality of openings and configured to support the substrate, a lift support positioned outside the stage table from a plan view and vertically movable to support the substrate, an actuator configured to vertically actuate the plurality of lift pins and the lift support so as to load the substrate onto the stage table, and a controller configured to control the actuator.

Patent Agency Ranking