公开(公告)号：US20240038492A1

公开(公告)日：2024-02-01

申请号：US18121103

申请日：2023-03-14

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： HYUNGJOON KIM ,  KIYONG KIM ,  YOUNGKWON KIM ,  JAEHYUN KIM ,  YOODONG YANG ,  MINSUCK YOO ,  JONGHYUN LEE ,  ILJUN JEON ,  HEE JONG JEONG

IPC: H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/32532 ,  H01J37/32724 ,  H01J2237/3321

Abstract: A substrate supporting apparatus includes a heating plate, a radio frequency (RF) electrode in the heating plate, and an RF delivery structure in contact with a bottom surface of the RF electrode. The heating plate includes a first insertion hole, which is recessed into the heating plate from a bottom surface of the heating plate to expose the bottom surface of the RF electrode. The RF delivery structure includes an RF rod, a portion of which is inserted in the first insertion hole, and through which an RF power is supplied to the RF electrode. The RF rod includes a first material, and a relative permeability of the first material is less than 100, a volume resistivity of the first material is smaller than 70 nΩm, and a melting point of the first material is higher than 1400° C.

公开(公告)号：US20170037537A1

公开(公告)日：2017-02-09

申请号：US15204994

申请日：2016-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Seung-Min RYU ,  Sang Min LEE ,  HEE JONG JEONG ,  CHAEHO KIM ,  Ji Su SON ,  JAEBONG LEE ,  JUWAN LIM ,  JUNGWOO CHOI

IPC: C30B25/16 ,  C30B25/12 ,  C30B25/10 ,  C30B25/14 ,  C23C16/455 ,  C30B29/10 ,  C23C16/458 ,  C23C16/50 ,  C23C16/44 ,  C30B25/08 ,  C30B29/06

CPC classification number: C30B25/16 ,  C23C16/4584 ,  C23C16/4585 ,  C23C16/481 ,  C23C16/52 ,  C30B25/105

Abstract: An apparatus is provided for depositing a thin film. The apparatus includes a chamber, a susceptor disposed in the chamber and supporting a substrate, a reflection housing disposed outside the chamber, a light source unit disposed in the reflection housing and irradiating light to the susceptor, and a light controlling unit blocking at least a portion of an irradiation path of the light to control an irradiation area of the light on the susceptor. At least a portion of the light controlling unit is disposed in the reflection housing.

Abstract translation: 提供了一种用于沉积薄膜的装置。 该装置包括：室，设置在室中的基座和支撑基板;设置在室外的反射壳体;设置在反射壳体中并将光照射到基座的光源单元;以及光控制单元， 光的照射路径的一部分，以控制基座上的光的照射面积。 光控制单元的至少一部分设置在反射壳体中。