公开(公告)号：US20240142886A1

公开(公告)日：2024-05-02

申请号：US18322161

申请日：2023-05-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Sungyong Bae ,  Daegeun Yoon ,  Inho Choi ,  Sunghyup Kim ,  Euishin Kim ,  Jeonggil Kim ,  Yebin Nam ,  Dongjin Lee ,  Jonggu Lee ,  Dohyun Jung ,  Dongsik Jeong

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70908 ,  G03F7/70716 ,  H01L21/68

Abstract: A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.

公开(公告)号：US12298676B2

公开(公告)日：2025-05-13

申请号：US18322161

申请日：2023-05-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Injae Lee ,  Sungyong Bae ,  Daegeun Yoon ,  Inho Choi ,  Sunghyup Kim ,  Euishin Kim ,  Jeonggil Kim ,  Yebin Nam ,  Dongjin Lee ,  Jonggu Lee ,  Dohyun Jung ,  Dongsik Jeong

IPC: G03F7/00 ,  H01L21/68

Abstract: A substrate processing apparatus includes a table in an exposure chamber that is configured to perform an exposure process on a semiconductor substrate, a guiding device including a first horizontal driving body slidably movable in a first horizontal direction and a guide rail on the first horizontal driving body and having a trench extending in a second horizontal direction, a positioning device connected to the guiding device, the positioning device including a slider, a second horizontal driving body and a substrate stage, the slider configured to slidably move in the second horizontal direction along the trench, the second horizontal driving body connected or fixed to the slider, the substrate stage on the second horizontal driving body and configured to support the semiconductor substrate, and a blocking member between the guide rail and the substrate stage to block an inflow of foreign substances onto the substrate stage.

公开(公告)号：US20240215140A1

公开(公告)日：2024-06-27

申请号：US18520472

申请日：2023-11-27

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Daegeun Yoon ,  Sunghyup Kim ,  Seungpyo Hong ,  Injae Lee

IPC: H05G2/00

CPC classification number: H05G2/008

Abstract: A source vessel for extreme ultraviolet (EUV) includes a body that includes an outlet for discharging tin debris disposed in a central portion and an intermediate focus (IF) disposed in an upper end portion, and a reflector disposed in a lower end of the body and that includes a through-hole through which laser light passes. The body includes an IF cap portion disposed on a lower portion of the intermediate focus and that includes a heater disposed on an outer surface thereof, and an IF scanner portion disposed on an upper portion of the intermediate focus and that includes a cooling pipe disposed on an external surface thereof. An inner surface of the IF cap portion includes a flow groove through which tin residue flows, and the source vessel further includes a collection container connected to the flow groove.