公开(公告)号：US20230143327A1

公开(公告)日：2023-05-11

申请号：US17850478

申请日：2022-06-27

Applicant: Samsung Electronics Co., Ltd.

Inventor： DONGSEOK HAN ,  Seunghan BAEK ,  KYUNG-SUN KIM ,  Nam Kyun KIM ,  SANG KI NAM ,  KUIHYUN YOON ,  KANGMIN JEON

IPC: H01J37/32 ,  H01L21/683

CPC classification number: H01J37/32642 ,  H01J37/32724 ,  H01J37/32807 ,  H01L21/6833 ,  H01J2237/2007 ,  H01J2237/334

Abstract: Disclosed are focus rings, substrate processing apparatuses including the same, and substrate processing methods using the same. The focus ring comprises a first ring formed around an axis that extends in a first direction and a second ring separate from the first ring and formed around the axis. A portion of an inner lateral surface of the second ring is in contact with a portion of an outer lateral surface of the first ring. When viewed from a cross-sectional view from a direction perpendicular to the axis, a first angle between the outer lateral surface and the first direction is different from a second angle between the inner lateral surface and the first direction.