公开(公告)号：US20210183618A1

公开(公告)日：2021-06-17

申请号：US17186965

申请日：2021-02-26

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dong-Hyub LEE ,  Dougyong SUNG ,  Je-Hun WOO ,  Bongseong KIM ,  Juho LEE ,  Yun-Kwang JEON ,  Junghyun CHO

IPC: H01J37/32

Abstract: Embodiments of the inventive concepts provide antennas, plasma generating circuits, plasma processing apparatus, and methods for manufacturing semiconductor devices using the same. The circuits include radio-frequency power sources generating radio-frequency powers, antennas receiving the radio-frequency powers to generate plasma and having a first mutual inductance, and inductors connecting the antennas to the radio-frequency power sources, respectively. The inductors have a second mutual inductance reducing and/or canceling the first mutual inductance.

公开(公告)号：US20180114675A1

公开(公告)日：2018-04-26

申请号：US15723837

申请日：2017-10-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Dong-Hyub LEE ,  Dougyong SUNG ,  Je-Hun WOO ,  Bongseong KIM ,  Juho Lee ,  Yun-Kwang JEON ,  Junghyun CHO

IPC: H01J37/32

CPC classification number: H01J37/3211 ,  H01J37/32119 ,  H01J37/32174 ,  H01J37/32183 ,  H01L21/67069

Abstract: Embodiments of the inventive concepts provide antennas, plasma generating circuits, plasma processing apparatus, and methods for manufacturing semiconductor devices using the same. The circuits include radio-frequency power sources generating radio-frequency powers, antennas receiving the radio-frequency powers to generate plasma and having a first mutual inductance, and inductors connecting the antennas to the radio-frequency power sources, respectively. The inductors have a second mutual inductance reducing and/or canceling the first mutual inductance.

公开(公告)号：US20160056017A1

公开(公告)日：2016-02-25

申请号：US14799588

申请日：2015-07-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Moojin KIM ,  Bongseong KIM ,  Unjoo LEE

IPC: H01J37/32

CPC classification number: H01J37/321 ,  H01J37/32706 ,  H01J37/32972

Abstract: A plasma apparatus includes a chuck disposed in a process chamber, a gas supply unit supplying a process gas into the process chamber, a plasma generating unit configured to generate plasma over the chuck, a direct current (DC) power generator applying a DC pulse signal to the chuck, and a sensor monitoring a state of the plasma and providing a sensing signal to the DC power generator. Each period of the DC pulse signal includes a negative pulse duration, a positive pulse duration, and a pulse-off duration. If a signal disturbance of the sensing signal occurs in an nth period of the DC pulse signal, the DC power generator changes a magnitude of a positive pulse and/or a length of the positive pulse duration of an n+1th period of the DC pulse signal, where “n” denotes a natural number.

Abstract translation: 一种等离子体装置，包括设置在处理室中的卡盘，将处理气体供应到处理室中的气体供应单元，配置成在卡盘上产生等离子体的等离子体产生单元，施加DC脉冲信号的直流（DC）功率发生器 并且传感器监测等离子体的状态并向DC发电机提供感测信号。 DC脉冲信号的每个周期包括负脉冲持续时间，正脉冲持续时间和脉冲关闭持续时间。 如果在直流脉冲信号的第n个周期中发生感测信号的信号干扰，则直流发电机改变正脉冲的大小和/或直流脉冲的第n + 1个周期的正脉冲持续时间的长度 信号，其中“n”表示自然数。