Laser processing method and method of manufacturing display apparatus

    公开(公告)号:US11213914B2

    公开(公告)日:2022-01-04

    申请号:US15422847

    申请日:2017-02-02

    Abstract: Provided are a laser processing method capable of performing various types of processing while reducing a need to change components and method of manufacturing a display apparatus by using the laser processing method. The laser processing method includes: splitting a laser beam emitted from a laser beam source into a plurality of laser beams by using a laser beam splitter; and transmitting at least two of the plurality of laser beams through a position adjustment equipment that is on paths of the at least two laser beams in order to adjust a distance between the at least two laser beams by using a difference between a refractive index of an element of the position adjustment equipment and a refractive index of a peripheral environment.

    DEPOSITION APPARATUS AND METHOD OF DEPOSITING THIN-FILM OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE DEPOSITION APPARATUS
    7.
    发明申请
    DEPOSITION APPARATUS AND METHOD OF DEPOSITING THIN-FILM OF ORGANIC LIGHT-EMITTING DISPLAY DEVICE BY USING THE DEPOSITION APPARATUS 审中-公开
    沉积装置和使用沉积装置沉积有机发光显示装置的薄膜的方法

    公开(公告)号:US20160072065A1

    公开(公告)日:2016-03-10

    申请号:US14614019

    申请日:2015-02-04

    Abstract: Provided is a deposition apparatus including a deposition source including a plurality of nozzles that spray a deposition material onto a substrate; a mask disposed between the substrate and the deposition source and separated from the substrate, and including a plurality of first openings through which the deposition material passes; and at least one deposition incident angle adjusting plate disposed between the mask and the deposition source and including a plurality of second openings for adjusting a deposition incident angle of the deposition material that is sprayed from the plurality of nozzles; wherein the at least one deposition incident angle adjusting plate is movable in a first direction toward the substrate or a second direction opposite the first direction, and the deposition incident angle adjusting plate is spaced apart from the nozzles.

    Abstract translation: 提供了一种沉积设备,其包括沉积源,该沉积源包括将沉积材料喷射到基底上的多个喷嘴; 掩模,其设置在所述基板和所述沉积源之间并与所述基板分离,并且包括沉积材料通过的多个第一开口; 以及设置在所述掩模和所述沉积源之间的至少一个沉积入射角调整板,并且包括用于调节从所述多个喷嘴喷射的沉积材料的沉积入射角的多个第二开口; 其特征在于,所述至少一个沉积入射角度调整板可朝向所述基板朝向第一方向移动或与所述第一方向相反的第二方向移动,并且所述沉积入射角度调整板与所述喷嘴间隔开。

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