公开(公告)号：US20190288015A1

公开(公告)日：2019-09-19

申请号：US16356551

申请日：2019-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Kyun KIM ,  Jinsuek Kim ,  Seungbo Shim ,  Shinhyuk Choi ,  Woonhyung Shim ,  Donghee Lee

IPC: H01L27/12 ,  H01L21/3213 ,  G02F1/1362 ,  C09K13/06 ,  C09K13/08

Abstract: An etchant composition including a persulfate, a four-nitrogen ring compound, a carbonyl ring compound having two or more carbonyl groups, and water, and having a weight ratio of the four-nitrogen ring compound and the carbonyl ring compound of about 1:0.1 to about 1:2. The etchant composition may etch a multilayer of titanium/copper and may be used for manufacturing a metal pattern and an array substrate having excellent properties of an etched pattern.

公开(公告)号：US10910412B2

公开(公告)日：2021-02-02

申请号：US16356551

申请日：2019-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Bong-Kyun Kim ,  Jinsuek Kim ,  Seungbo Shim ,  Shinhyuk Choi ,  Woonhyung Shim ,  Donghee Lee

IPC: H01L27/12 ,  H01L21/3213 ,  G02F1/1362 ,  C09K13/06 ,  C09K13/08

Abstract: An etchant composition including a persulfate, a four-nitrogen ring compound, a carbonyl ring compound having two or more carbonyl groups, and water, and having a weight ratio of the four-nitrogen ring compound and the carbonyl ring compound of about 1:0.1 to about 1:2. The etchant composition may etch a multilayer of titanium/copper and may be used for manufacturing a metal pattern and an array substrate having excellent properties of an etched pattern.