公开(公告)号：US20220131018A1

公开(公告)日：2022-04-28

申请号：US17447043

申请日：2021-09-07

Applicant: Samsung Display Co., Ltd.

Inventor： Woo Seok JEON

IPC: H01L31/0216 ,  H01L27/32 ,  H01L31/105 ,  G06K9/00

Abstract: A fingerprint sensor, includes: a light sensing layer including a photo-sensing element to flow a sensing current according to incident light; and a collimator layer on the light sensing layer, the collimator layer including: a first light blocking layer having a plurality of first holes; a first light transmitting layer on the first light blocking layer; and a second light blocking layer on the first light transmitting layer, and having a plurality of second holes overlapping with the plurality of first holes.

公开(公告)号：US20170110481A1

公开(公告)日：2017-04-20

申请号：US15130654

申请日：2016-04-15

Applicant: Samsung Display Co., Ltd.

Inventor： Yung Bin CHUNG ,  Bo Geon JEON ,  Eun Jeong CHO ,  Tae Young AHN ,  Woo Seok JEON ,  Sung Hoon YANG

IPC: H01L27/12 ,  G02F1/1362 ,  H01L29/786 ,  H01L21/4763 ,  H01L29/423 ,  H01L21/3213 ,  H01L21/306 ,  H01L21/465 ,  G02F1/1368 ,  H01L29/45

CPC classification number: H01L27/1222 ,  G02F1/136286 ,  G02F1/1368 ,  G02F2001/136295 ,  H01L21/30604 ,  H01L21/32133 ,  H01L21/465 ,  H01L21/47635 ,  H01L27/1262 ,  H01L29/42356 ,  H01L29/45 ,  H01L29/78606

Abstract: Provided are liquid crystal display and the method for manufacturing the same. According to an aspect of the present invention, there is provided a liquid crystal display device, including a first substrate; a gate electrode disposed on the first substrate; a semiconductor pattern layer disposed on the gate electrode; and a source electrode and a drain electrode disposed on the semiconductor pattern layer and facing each other, wherein a diffusion prevention pattern is disposed on the semiconductor pattern layer to prevent diffusion into the semiconductor pattern layer or to maintain uniform thickness of the semiconductor pattern layer.

公开(公告)号：US20170069843A1

公开(公告)日：2017-03-09

申请号：US15092967

申请日：2016-04-07

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Hoon KANG ,  Bum Soo KAM ,  Chong Sup CHANG ,  Woo Seok JEON

IPC: H01L51/00 ,  B05B15/04

CPC classification number: H01L51/0011 ,  C23C14/042 ,  H01L27/3211 ,  H01L51/5012 ,  H01L51/56

Abstract: A method of fabricating a deposition mask, the method including forming a photoresist pattern on a base member, the photoresist pattern having a plurality of inversely tapered photo patterns and a photo opening defined by the photo patterns; forming a mask material layer in the photo opening and on the photo patterns; removing the photo patterns and the mask material layer formed on the photo patterns, leaving the mask material layer formed in the photo opening; and removing the base member.

Abstract translation: 一种制造沉积掩模的方法，所述方法包括在基底构件上形成光致抗蚀剂图案，光致抗蚀剂图案具有多个反向渐变的照片图案和由照片图案限定的照片开口; 在照片开口和照片图案上形成掩模材料层; 去除形成在照片图案上的照片图案和掩模材料层，留下形成在照片开口中的掩模材料层; 并移除基座部件。