公开(公告)号：US09146638B2

公开(公告)日：2015-09-29

申请号：US14062034

申请日：2013-10-24

Applicant: Samsung Display Co., Ltd.

Inventor： Valeriy Prushinskiy ,  Minsoo Kim ,  Wonsik Hyun ,  Mu Gyeom Kim ,  Kee Hyun Nam

IPC: G06F3/041 ,  G06F1/16 ,  H04M1/02 ,  G02F1/1333

CPC classification number: G06F3/0416 ,  G02F1/133305 ,  G06F1/1652 ,  G06F3/017 ,  G06F3/0412 ,  G06F3/0487 ,  G06F2203/04102 ,  H04M1/0268 ,  H04M2250/22

Abstract: An electronic device includes a flexible touch screen including a display unit configured to display an image and a bending unit configured to sense a user bending input and a body part disposed below the flexible touch screen and including a controller configured to control a transition from a lock state to an unlock state of the flexible touch screen based on the user bending input and a memory configured to store a predefined bending action used to transition from the lock state to the unlock state of the flexible touch screen.

Abstract translation: 电子设备包括柔性触摸屏，其包括被配置为显示图像的显示单元和被配置为感测用户弯曲输入的弯曲单元和设置在柔性触摸屏下方的主体部分，并且包括被配置为控制从锁定 基于用户弯曲输入状态到柔性触摸屏的解锁状态，以及被配置为存储用于从柔性触摸屏的锁定状态转换到解锁状态的预定弯曲动作的存储器。

公开(公告)号：US09410237B2

公开(公告)日：2016-08-09

申请号：US14018701

申请日：2013-09-05

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： HeungYeol Na ,  Jae hong Ahn ,  Wonsik Hyun

IPC: C23C14/24

CPC classification number: C23C14/243

Abstract: A thin film deposition apparatus includes a vacuum chamber, a substrate supporter disposed in the vacuum chamber to support a target substrate on which a thin film is deposited, and a deposition source that evaporates a deposition material and supplies the evaporated deposition material to the target substrate. The deposition source includes a crucible that includes a deposition material-containing portion to accommodate the deposition material and a first flange at an upper end of the deposition material-containing portion, a spray nozzle that includes a spray portion through which the evaporated deposition material is sprayed and a second flange at a lower end of the spray portion to make contact with the first flange, and a cooling member attached to an outer surface of the first flange and the second flange.

Abstract translation: 薄膜沉积设备包括真空室，设置在真空室中以支撑其上沉积有薄膜的目标基板的基板支撑件和蒸发沉积材料并将蒸发的沉积材料供应到目标基板的沉积源 。 沉积源包括坩埚，其包括用于容纳沉积材料的沉积材料容纳部分和在沉积材料容纳部分的上端处的第一凸缘，喷嘴，其包括喷射部分，蒸发的沉积材料通过该喷射部分 并且在喷雾部分的下端具有与第一凸缘接触的第二凸缘，以及附接到第一凸缘和第二凸缘的外表面的冷却构件。