公开(公告)号：US11148230B2

公开(公告)日：2021-10-19

申请号：US16166170

申请日：2018-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Taras Litoshenko ,  Voronov Alexander ,  Gyoowan Han

IPC: B23K26/382 ,  B23K26/082 ,  B23K26/067 ,  B23K26/0622 ,  C23C14/04 ,  C23C16/04 ,  B23K26/06 ,  H01L51/00

Abstract: A method of manufacturing a deposition mask including: arranging a deposition mask to be processed on a stage and forming a deposition hole in the deposition mask by irradiating the deposition mask with a laser beam. The laser beam forming the deposition hole is irradiated plural times in an identical moving path in a region where the deposition hole is formed, the laser beam includes a pulse laser, and pulse energy of the laser beam when the laser beam is irradiated once is different from pulse energy of the laser beam when the laser beam is irradiated twice.

公开(公告)号：US20190126406A1

公开(公告)日：2019-05-02

申请号：US16166170

申请日：2018-10-22

Applicant: Samsung Display Co., Ltd.

Inventor： Taras Litoshenko ,  Voronov Alexander ,  Gyoowan Han

IPC: B23K26/382 ,  B23K26/082 ,  B23K26/067 ,  B23K26/06 ,  B23K26/0622 ,  C23C14/04 ,  C23C16/04

Abstract: A method of manufacturing a deposition mask including: arranging a deposition mask to be processed on a stage and forming a deposition hole in the deposition mask by irradiating the deposition mask with a laser beam. The laser beam forming the deposition hole is irradiated plural times in an identical moving path in a region where the deposition hole is formed, the laser beam includes a pulse laser, and pulse energy of the laser beam when the laser beam is irradiated once is different from pulse energy of the laser beam when the laser beam is irradiated twice.