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公开(公告)号：US10101508B2
公开(公告)日：2018-10-16
申请号：US14929444
申请日：2015-11-02
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Young Suk Cho , Tae Min Kang
Abstract: An apparatus for forming an optical pattern includes a vacuum chamber, a mount on which a substrate to be prepared using a mask is to be supported, a diffusion unit adjacent the mask, spaced apart from the mask by a preset interval, and facing the mask, the diffusion unit to diffuse light incident thereon as uniform surface light and transmit the uniform surface light to the mask, and a light source unit spaced in a lateral direction from the diffusion unit, the light source unit to generate light to be incident on the diffusion unit.
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Patent Agency Ranking
公开(公告)号：US09897539B2
公开(公告)日：2018-02-20
申请号：US14860888
申请日：2015-09-22
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor： Tae Min Kang , Seung Mook Lee , Young Suk Cho
CPC classification number: G01N21/53 , C23C14/544 , G01F1/00
Abstract: An apparatus for measuring a deposition rate includes a light source unit in a deposition region between a deposition source and a substrate in a vacuum chamber, the light source unit emits a monochromatic light toward a deposition material released from the deposition source, a photosensor unit that measures at least one of light absorption, scattering, and emission in the deposition region when light emitted from the light source unit passes through the deposition region, and a multi-pass forming unit defining a multi-pass path between the light source unit and the photosensor unit.
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公开(公告)号：US20170080695A1
公开(公告)日：2017-03-23
申请号：US15371564
申请日：2016-12-07
Applicant: Samsung Display Co., Ltd.
Inventor： Tae Min Kang
CPC classification number: B32B37/10 , B29C65/18 , B29C66/1122 , B29C66/24244 , B29C66/433 , B29C66/8322 , B32B37/025 , B32B37/06 , B32B37/18 , B32B38/004 , B32B2250/03 , B32B2309/68 , H01L51/0013 , H01L51/5012
Abstract: Provided are a laminating apparatus and a laminating method using the same. In an aspect, the laminating apparatus includes a stage, a heating bar, and a press part. In an aspect, the laminating may be performed in a state where the donor film is closely attached to the substrate to prevent defects of the donor film from occurring during the laminating, thereby improving reliability of the laminating apparatus.
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公开(公告)号：US09595674B2
公开(公告)日：2017-03-14
申请号：US14855890
申请日：2015-09-16
Applicant: Samsung Display Co., Ltd.
Inventor： Tae Min Kang , Young Suk Cho
CPC classification number: H01L51/0002 , C23C14/042 , H01L51/0011 , H01L51/5012 , H01L51/56
Abstract: A method of manufacturing a mask includes aligning a mask substrate comprising a thin film at a processing position, forming a coating layer comprising a cleaning solution material on a first surface of the mask substrate, forming a deposition pattern on a second surface of the mask substrate, and removing the coating layer from the mask substrate comprising the deposition pattern.
Abstract translation: 制造掩模的方法包括：在处理位置对准包括薄膜的掩模基板，在掩模基板的第一表面上形成包括清洗溶液材料的涂层，在掩模基板的第二表面上形成沉积图案 并且从包括沉积图案的掩模基板去除涂层。
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公开(公告)号：US20140326404A1
公开(公告)日：2014-11-06
申请号：US14020273
申请日：2013-09-06
Applicant: Samsung Display Co., Ltd.
Inventor： Tae Min Kang
IPC: B32B37/10
CPC classification number: B32B37/10 , B29C65/18 , B29C66/1122 , B29C66/24244 , B29C66/433 , B29C66/8322 , B32B37/025 , B32B37/06 , B32B37/18 , B32B38/004 , B32B2250/03 , B32B2309/68 , H01L51/0013 , H01L51/5012
Abstract: Provided are a laminating apparatus and a laminating method using the same. In an aspect, the laminating apparatus includes a stage, a heating bar, and a press part. In an aspect, the laminating may be performed in a state where the donor film is closely attached to the substrate to prevent defects of the donor film from occurring during the laminating, thereby improving reliability of the laminating apparatus.
Abstract translation: 提供一种层压装置和使用该装置的层压方法。 在一方面，层压装置包括台，加热棒和压榨部。 在一个方面，层压可以在供体膜紧密地附着于基底的状态下进行，以防止在层压期间发生施主膜的缺陷，从而提高层压装置的可靠性。
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公开(公告)号：US09170484B2
公开(公告)日：2015-10-27
申请号：US14023765
申请日：2013-09-11
Applicant: Samsung Display Co., Ltd.
Inventor： Tae Min Kang
CPC classification number: G03F1/68
Abstract: A method of manufacturing a mask includes: providing a base substrate including light-absorbing layer patterns on a first surface thereof; providing a reflective layer on the light-absorbing layer patterns and the first surface of the base substrate; and providing reflective patterns by partially removing the reflective layer. The providing the reflective patterns includes removing the light-absorbing layer patterns and a portion of the reflective layer, by irradiating the light-absorbing layer patterns with laser light.
Abstract translation: 制造掩模的方法包括：在其第一表面上提供包括光吸收层图案的基底基板; 在所述光吸收层图案和所述基底基板的第一表面上设置反射层; 以及通过部分去除反射层来提供反射图案。 提供反射图案包括通过用激光照射光吸收层图案来去除光吸收层图案和反射层的一部分。
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