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    DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME
    1.
    发明申请
    DISPLAY APPARATUS AND METHOD OF MANUFACTURING THE SAME 有权

    公开(公告)号：US20250089534A1

    公开(公告)日：2025-03-13

    申请号：US18823057

    申请日：2024-09-03

    Applicant: Samsung Display Co., Ltd.

    Inventor： Sungwoo Eo

    IPC: H10K59/80 ,  H10K59/12 ,  H10K102/00

    Abstract: A display apparatus includes: a display panel having a folding area and a non-folding area; a first plate on one surface of the display panel and comprising a first area and a second area, wherein the first area corresponds to the folding area of the display panel, and the second area corresponds to the non-folding area of the display panel; and a cover layer between the first plate and the display panel and in direct contact with at least a portion of the first plate, wherein the first area of the first plate comprises a plurality of slits each having a length in a first direction parallel to a folding axis of the folding area and being at least partially covered by the cover layer, and a width of each of the plurality of slits in a second direction perpendicular to the first direction is 100 micrometers (μm) or less.

    Foldable display device
    2.
    发明授权
    Foldable display device 有权

    公开(公告)号：US11501670B2

    公开(公告)日：2022-11-15

    申请号：US17515795

    申请日：2021-11-01

    Applicant: Samsung Display Co., Ltd.

    Inventor： Sanggu Kim ,  Sungwoo Eo

    IPC: G06F3/041 ,  G09F9/30 ,  G02B1/14 ,  G02B1/11 ,  G06F1/16

    Abstract: A display device includes: a display module; a window disposed on the display module; a window protective layer disposed on the window; and a window adhesive layer disposed between the window and the window protective layer, wherein the window adhesive layer includes a surfactant, and has an adhesive force of about 100 gf/inch to about 300 gf/inch at about 25° C.

    Polishing apparatus
    7.
    发明授权
    Polishing apparatus 有权

    公开(公告)号：US10040163B2

    公开(公告)日：2018-08-07

    申请号：US15166163

    申请日：2016-05-26

    Applicant: Samsung Display Co., Ltd.

    Inventor： Sungwoo Eo ,  Hyunchul Jung

    IPC: B24B29/04

    CPC classification number: B24B29/04 ,  B24B19/009 ,  B24B19/26 ,  B24B27/0076 ,  B24B29/005 ,  B24B29/02 ,  B24B41/06

    Abstract: A polishing apparatus includes a jig unit including a substrate supporting part having a placing surface on which a substrate having a first curvature is placed. The placing surface has a second curvature corresponding to the first curvature and a polishing unit includes at least one polishing part to be rotated to polish a process surface of the substrate. The process surface of the curved substrate may be uniformly polished and foreign substances generated during the polishing process are prevented from entering into the substrate.

    POLISHING APPARATUS
    8.
    发明申请
    POLISHING APPARATUS 审中-公开
    抛光装置

    公开(公告)号：US20170057047A1

    公开(公告)日：2017-03-02

    申请号：US15166163

    申请日：2016-05-26

    Applicant: Samsung Display Co., Ltd.

    Inventor： Sungwoo Eo ,  Hyunchul Jung

    IPC: B24B29/04

    CPC classification number: B24B29/04

    Abstract: A polishing apparatus includes a jig unit including a substrate supporting part having a placing surface on which a substrate having a first curvature is placed. The placing surface has a second curvature corresponding to the first curvature and a polishing unit includes at least one polishing part to be rotated to polish a process surface of the substrate. The process surface of the curved substrate may be uniformly polished and foreign substances generated during the polishing process are prevented from entering into the substrate.

    Abstract translation: 抛光装置包括夹具单元，该夹具单元包括具有放置表面的基板支撑部分，其上放置有具有第一曲率的基板。 所述放置表面具有对应于所述第一曲率的第二曲率，并且抛光单元包括至少一个要旋转以抛光所述基底的处理表面的抛光部分。 可以均匀地抛光弯曲基板的工艺表面，防止在抛光过程中产生的异物进入基板。

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