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公开(公告)号:US20190211445A1
公开(公告)日:2019-07-11
申请号:US16160757
申请日:2018-10-15
Applicant: Samsung Display Co., Ltd.
Inventor: Seokjin Ko , Myungsoo Huh , Sukwon Jung , Dongkyun Ko , Inkyo Kim
CPC classification number: C23C16/4405 , C23C16/46
Abstract: An apparatus for manufacturing a display apparatus includes: a chamber; a head unit configured to supply a process gas and a cleaning gas to an inside of the chamber; which has a storage space where the process gas or the cleaning gas is temporarily stored, and including a nozzle connected to the storage space and configured to guide the process gas or the cleaning gas from the storage space to the inside of the chamber; a susceptor unit arranged to face the head unit and on which a substrate is placeable; a cleaning gas supply unit connected to the head unit and configured to plasmarize the cleaning gas and supply the cleaning gas that is plasmarized to the head unit; and a cleaning gas ejection unit connected to the cleaning gas supply unit and configured to supply the cleaning gas to at least two portions of the storage space.
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公开(公告)号:US11186908B2
公开(公告)日:2021-11-30
申请号:US16160757
申请日:2018-10-15
Applicant: Samsung Display Co., Ltd.
Inventor: Seokjin Ko , Myungsoo Huh , Sukwon Jung , Dongkyun Ko , Inkyo Kim
IPC: C23C16/44 , C23C16/46 , H01L21/00 , H01J37/32 , C23C16/455
Abstract: An apparatus for manufacturing a display apparatus includes: a chamber; a head unit configured to supply a process gas and a cleaning gas to an inside of the chamber; which has a storage space where the process gas or the cleaning gas is temporarily stored, and including a nozzle connected to the storage space and configured to guide the process gas or the cleaning gas from the storage space to the inside of the chamber; a susceptor unit arranged to face the head unit and on which a substrate is placeable; a cleaning gas supply unit connected to the head unit and configured to plasmarize the cleaning gas and supply the cleaning gas that is plasmarized to the head unit; and a cleaning gas ejection unit connected to the cleaning gas supply unit and configured to supply the cleaning gas to at least two portions of the storage space.
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