公开(公告)号：US09757764B2

公开(公告)日：2017-09-12

申请号：US13950595

申请日：2013-07-25

Applicant: Samsung Display Co., Ltd.

Inventor： Jae-Min Hong ,  Sang-Hyuk Park ,  Woo-Young Jung ,  Ha-Nul Kwen ,  Suk-Ho Kang ,  Jeong-Yeol Lee

IPC: C23C14/00 ,  B05C21/00 ,  C23C14/04 ,  H01L51/00

CPC classification number: B05C21/005 ,  C23C14/042 ,  H01L51/0011 ,  Y10T29/4978 ,  Y10T29/49826

Abstract: A mask for deposition for forming a pattern on a transparent substrate according to the present invention includes a mask member having a mask alignment mark penetratedly formed so as to be aligned with a substrate alignment mark formed on the transparent substrate; and an unevenness region formed on one surface of the mask member so as to be adjacent to the mask alignment mark and having protrusions and depressions on a surface thereof. In accordance with embodiments of the present invention, it is possible to prevent the alignment error of the mask from occurring by increasing the recognition rate of the align marks formed on the substrate and the mask. As a result, it is possible to reduce the manufacturing costs by reducing the defective rate of the organic light emitting diode (OLED) display device.

公开(公告)号：US09289798B2

公开(公告)日：2016-03-22

申请号：US13789343

申请日：2013-03-07

Applicant: Samsung Display Co., Ltd.

Inventor： Sang-Hyuk Park ,  Jae-Min Hong ,  Woo-Young Jung ,  Ha-Nul Kwen

IPC: C23C14/04 ,  B05C21/00 ,  H01L51/00

CPC classification number: B05C21/005 ,  C23C14/042 ,  H01L51/0011

Abstract: A mask having both ends supported on a frame when a tensile force is applied in a first direction includes: a mask main body unit having a band form extended in the first direction; a plurality of pattern units including a plurality of pattern slits extended and opened in the first direction and separately disposed in a second direction crossing the first direction, and disposed in the mask main body unit in the first direction; and a plurality of dummy units including a plurality of dummy slits separated from each other with the pattern units therebetween, disposed in the mask main body unit, extended and opened in the first direction, and separately disposed in the second direction.

Abstract translation: 当沿第一方向施加张力时，在框架上支撑两端的掩模包括：具有沿第一方向延伸的带状的掩模主体单元; 多个图案单元，包括沿着所述第一方向延伸和打开的多个图案狭缝，并且沿与所述第一方向交叉的第二方向分开设置，并且沿所述第一方向设置在所述面罩主体单元中; 以及多个虚设单元，包括多个彼此分开的虚拟狭缝，其间具有图案单元，设置在掩模主体单元中，沿第一方向延伸并打开，并且沿第二方向分开设置。

公开(公告)号：US20130298826A1

公开(公告)日：2013-11-14

申请号：US13789343

申请日：2013-03-07

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Sang-Hyuk Park ,  Jae-Min Hong ,  Woo-Young Jung ,  Ha-Nul Kwen

IPC: B05C21/00

CPC classification number: B05C21/005 ,  C23C14/042 ,  H01L51/0011

Abstract: A mask having both ends supported on a frame when a tensile force is applied in a first direction includes: a mask main body unit having a band form extended in the first direction; a plurality of pattern units including a plurality of pattern slits extended and opened in the first direction and separately disposed in a second direction crossing the first direction, and disposed in the mask main body unit in the first direction; and a plurality of dummy units including a plurality of dummy slits separated from each other with the pattern units therebetween, disposed in the mask main body unit, extended and opened in the first direction, and separately disposed in the second direction.

Abstract translation: 当沿第一方向施加张力时，在框架上支撑两端的掩模包括：具有沿第一方向延伸的带状的掩模主体单元; 多个图案单元，包括沿着所述第一方向延伸和打开的多个图案狭缝，并且沿与所述第一方向交叉的第二方向分开设置，并且沿所述第一方向设置在所述面罩主体单元中; 以及多个虚设单元，包括多个彼此分开的虚拟狭缝，其间具有图案单元，设置在掩模主体单元中，沿第一方向延伸并打开，并且沿第二方向分开设置。