MASK AND MASK ASSEMBLY HAVING THE SAME
    1.
    发明申请
    MASK AND MASK ASSEMBLY HAVING THE SAME 有权
    掩蔽和掩蔽组合

    公开(公告)号:US20130298826A1

    公开(公告)日:2013-11-14

    申请号:US13789343

    申请日:2013-03-07

    CPC classification number: B05C21/005 C23C14/042 H01L51/0011

    Abstract: A mask having both ends supported on a frame when a tensile force is applied in a first direction includes: a mask main body unit having a band form extended in the first direction; a plurality of pattern units including a plurality of pattern slits extended and opened in the first direction and separately disposed in a second direction crossing the first direction, and disposed in the mask main body unit in the first direction; and a plurality of dummy units including a plurality of dummy slits separated from each other with the pattern units therebetween, disposed in the mask main body unit, extended and opened in the first direction, and separately disposed in the second direction.

    Abstract translation: 当沿第一方向施加张力时,在框架上支撑两端的掩模包括:具有沿第一方向延伸的带状的掩模主体单元; 多个图案单元,包括沿着所述第一方向延伸和打开的多个图案狭缝,并且沿与所述第一方向交叉的第二方向分开设置,并且沿所述第一方向设置在所述面罩主体单元中; 以及多个虚设单元,包括多个彼此分开的虚拟狭缝,其间具有图案单元,设置在掩模主体单元中,沿第一方向延伸并打开,并且沿第二方向分开设置。

    Mask and mask assembly having the same
    3.
    发明授权
    Mask and mask assembly having the same 有权
    面具和面具组合具有相同的

    公开(公告)号:US09289798B2

    公开(公告)日:2016-03-22

    申请号:US13789343

    申请日:2013-03-07

    CPC classification number: B05C21/005 C23C14/042 H01L51/0011

    Abstract: A mask having both ends supported on a frame when a tensile force is applied in a first direction includes: a mask main body unit having a band form extended in the first direction; a plurality of pattern units including a plurality of pattern slits extended and opened in the first direction and separately disposed in a second direction crossing the first direction, and disposed in the mask main body unit in the first direction; and a plurality of dummy units including a plurality of dummy slits separated from each other with the pattern units therebetween, disposed in the mask main body unit, extended and opened in the first direction, and separately disposed in the second direction.

    Abstract translation: 当沿第一方向施加张力时,在框架上支撑两端的掩模包括:具有沿第一方向延伸的带状的掩模主体单元; 多个图案单元,包括沿着所述第一方向延伸和打开的多个图案狭缝,并且沿与所述第一方向交叉的第二方向分开设置,并且沿所述第一方向设置在所述面罩主体单元中; 以及多个虚设单元,包括多个彼此分开的虚拟狭缝,其间具有图案单元,设置在掩模主体单元中,沿第一方向延伸并打开,并且沿第二方向分开设置。

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