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公开(公告)号:US20240057459A1
公开(公告)日:2024-02-15
申请号:US18321727
申请日:2023-05-22
Applicant: SAMSUNG DISPLAY CO., LTD.
Inventor: Yangho Jung , Kabjong Seo , Junho Sim , Jaehun Lee , Taewook Kang
CPC classification number: H10K59/8792 , H10K59/1201
Abstract: A display apparatus includes a substrate. A display element is disposed on the substrate. A first organic layer is disposed on the display element and includes a plurality of first organic patterns. The plurality of first organic patterns extends in a first direction and has reverse-graded sidewalls. A plurality of first light-shielding walls is disposed on sidewalls of the plurality of first organic patterns. A second organic layer is disposed on the first organic layer and includes a plurality of second organic patterns. The plurality of second organic patterns extends in the first direction and has sidewalls with alternating directions of inclination. A plurality of second light-shielding walls is disposed at sidewalls of the plurality of second organic patterns.
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公开(公告)号:US11282901B2
公开(公告)日:2022-03-22
申请号:US16894548
申请日:2020-06-05
Applicant: Samsung Display Co., Ltd.
Inventor: Sikwang Kim , Minsuk Ko , Kabjong Seo , Yong-Hoon Yang
Abstract: A display device includes a display panel, a control part below the display panel and including a first control layer below the display panel, a second control layer below the first control layer, and a third control layer below the second control layer. The first control layer includes a first transmission portion and a first absorption portion. The second control layer includes a second transmission portion and a second absorption portion. The third control layer includes a third transmission portion and a third absorption portion. The display panel also includes a sensing layer below the control part to recognize biometric information.
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公开(公告)号:US12178113B2
公开(公告)日:2024-12-24
申请号:US17463505
申请日:2021-08-31
Applicant: Samsung Display Co., Ltd.
Inventor: Kabjong Seo , Minsuk Ko , Bogeon Jeon
Abstract: A manufacturing method of a mask includes forming a first mask layer, forming a second mask layer on the first mask layer, forming a photoresist pattern layer on the second mask layer, removing a first area of the second mask layer, which is exposed through the photoresist pattern layer, defining an opening through the first mask layer, removing a portion of the photoresist pattern layer to expose a portion of a second area of the second mask layer, and removing the portion of the second area of the second mask layer.
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