公开(公告)号：US09631271B2

公开(公告)日：2017-04-25

申请号：US14218583

申请日：2014-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Ho Choi ,  Jong-Jin Park

IPC: C23C14/00 ,  C25B11/00 ,  C25B13/00 ,  C23C14/35 ,  H01J37/34

CPC classification number: C23C14/352 ,  H01J37/3417 ,  H01J37/3429 ,  H01J37/345 ,  H01J37/3452

Abstract: A sputtering system includes a chamber, a plurality of targets, and a substrate holder. The targets are disposed in the chamber. Each target includes a magnet unit disposed therein. The substrate holder is configured to support a substrate in the chamber. The magnet units are configured to generate a magnetic field between the targets. Each of the magnet units includes magnets disposed in two rows.

公开(公告)号：US20150027876A1

公开(公告)日：2015-01-29

申请号：US14218583

申请日：2014-03-18

Applicant: Samsung Display Co., Ltd.

Inventor： Seung-Ho CHOI ,  Jong-Jin Park

IPC: C23C14/35 ,  H01J37/34

CPC classification number: C23C14/352 ,  H01J37/3417 ,  H01J37/3429 ,  H01J37/345 ,  H01J37/3452

Abstract: A sputtering system includes a chamber, a plurality of targets, and a substrate holder. The targets are disposed in the chamber. Each target includes a magnet unit disposed therein. The substrate holder is configured to support a substrate in the chamber. The magnet units are configured to generate a magnetic field between the targets. Each of the magnet units includes magnets disposed in two rows.

Abstract translation: 溅射系统包括室，多个靶和衬底保持器。 靶位于腔室内。 每个目标包括设置在其中的磁体单元。 衬底保持器构造成支撑腔室中的衬底。 磁体单元配置成在目标之间产生磁场。 每个磁体单元包括设置成两排的磁体。