公开(公告)号：US11345988B2

公开(公告)日：2022-05-31

申请号：US16674997

申请日：2019-11-05

Applicant: Samsung Display Co., Ltd.

Inventor： Hwi Kim ,  In Bae Kim ,  Sung Soon Im ,  Kyu Hwan Hwang

IPC: C23C14/04 ,  C23C16/04 ,  H01L51/56 ,  H01L51/50

Abstract: A method of manufacturing a deposition mask includes preparing a mask-target substrate which has one surface on which a sacrificed layer pattern is formed and comprises a cover area covered by the sacrificed layer pattern and a plurality of exposed areas exposed by the sacrificed layer pattern; forming holes in the exposed areas of the mask-target substrate by emitting laser toward the mask-target substrate; and removing the sacrificed layer pattern, wherein the sacrificed layer pattern has a higher reflectance with respect to the laser than a reflectance of the mask-target substrate.