公开(公告)号：US20160216100A1

公开(公告)日：2016-07-28

申请号：US14799810

申请日：2015-07-15

Applicant: Samsung Display Co., Ltd.

Inventor： Jihun Kim ,  Dongil Kim

IPC: G01B7/06 ,  C23C16/52 ,  C23C16/50

CPC classification number: G01B7/085 ,  C23C14/545 ,  C23C16/50 ,  C23C16/52 ,  H01J37/32477 ,  H01J37/32853 ,  H01J37/32871 ,  H01J37/32917 ,  H01J37/32935

Abstract: An apparatus for measuring contamination of a plasma generating includes: a chamber; a susceptor provided in the chamber and on which a substrate is mounted; a plasma generator configured to generate plasma in the chamber; an inner jacket provided in the chamber and surrounding a space where the plasma is generated; a V-I probe electrically connected to the inner jacket and configured to detect a phase difference between a voltage and a current; a power supply unit configured to supply the voltage to the inner jacket through a blocking capacitor; and a monitor connected to the V-I probe and configured to store and display measurement data. A thickness of a contamination layer on a surface of the inner jacket is determined by analyzing a signal obtained by supplying the voltage to the inner jacket.

Abstract translation: 用于测量等离子体产生污染的装置包括：腔室; 设置在所述室中并且其上安装有基板的感受体; 等离子体发生器，其被配置为在所述室中产生等离子体; 设置在腔室中并围绕产生等离子体的空间的内护套; 电连接到所述内护套并被配置为检测电压和电流之间的相位差的V-I探头; 电源单元，被配置为通过隔离电容器将电压提供给所述内护套; 以及连接到V-I探头并被配置为存储和显示测量数据的监视器。 通过分析通过向内套提供电压获得的信号来确定内套表面上的污染层的厚度。