DEPOSITION SOURCE AND ORGANIC LAYER DEPOSITION APPARATUS INCLUDING THE SAME
    5.
    发明申请
    DEPOSITION SOURCE AND ORGANIC LAYER DEPOSITION APPARATUS INCLUDING THE SAME 有权
    沉积源和有机层沉积装置,包括它们

    公开(公告)号:US20160079534A1

    公开(公告)日:2016-03-17

    申请号:US14946686

    申请日:2015-11-19

    CPC classification number: H01L51/0004 C23C14/12 C23C14/243 H01L51/56

    Abstract: A deposition source and an organic layer deposition apparatus that may be simply applied to the manufacture of large-sized display apparatuses on a mass scale and may prevent or substantially prevent deposition source nozzles from being blocked during deposition of a deposition material, thereby improving manufacturing yield and deposition efficiency. A deposition source includes a first deposition source including a plurality of first deposition source nozzles, and a second deposition source including a plurality of second deposition source nozzles wherein the plurality of first deposition source nozzles and the plurality of second deposition source nozzles are tilted toward each other.

    Abstract translation: 沉积源和有机层沉积设备可以简单地应用于大规模的大型显示设备的制造,并且可以防止或基本上防止沉积源喷嘴在沉积材料沉积期间被阻挡,从而提高制造产量 和沉积效率。 沉积源包括包括多个第一沉积源喷嘴的第一沉积源和包括多个第二沉积源喷嘴的第二沉积源,其中多个第一沉积源喷嘴和多个第二沉积源喷嘴朝向每个 其他。

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