公开(公告)号：US20150108489A1

公开(公告)日：2015-04-23

申请号：US14579542

申请日：2014-12-22

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Joo-Han KIM ,  Ki-Yong SONG ,  Dong-Ju YANG ,  Hee-Joon KIM ,  Yeo-Geon YOON ,  Sung-Hen CHO ,  Chang-Hoon KIM ,  Jae-Hong KIM ,  Yu-Gwang JEONG ,  Ki-Yeup LEE ,  Sang-Gab KIM ,  Yun-Jong YEO ,  Shin-Il CHOI ,  Ji-Young PARK

IPC: H01L23/00 ,  H01L27/12

CPC classification number: H01L24/05 ,  G02F1/136227 ,  H01L27/12 ,  H01L27/1214 ,  H01L27/124 ,  H01L2224/04042 ,  H01L2924/14 ,  H01L2924/1426 ,  H01L2924/00

Abstract: A contact portion of wiring and a method of manufacturing the same are disclosed. A contact portion of wiring according to an embodiment includes: a substrate; a conductive layer disposed on the substrate; an interlayer insulating layer disposed on the conductive layer and having a contact hole; a metal layer disposed on the conductive layer and filling the contact hole; and a transparent electrode disposed on the interlayer insulating layer and connected to the metal layer, wherein the interlayer insulating layer includes a lower insulating layer and an upper insulating layer disposed on the lower insulating layer, the lower insulating layer is undercut at the contact hole, and the metal layer fills in the portion where the lower insulating layer is undercut.

Abstract translation: 公开了布线的接触部分及其制造方法。 根据实施例的布线的接触部分包括：基板; 设置在所述基板上的导电层; 设置在所述导电层上并具有接触孔的层间绝缘层; 设置在所述导电层上并填充所述接触孔的金属层; 以及透明电极，设置在所述层间绝缘层上并连接到所述金属层，其中所述层间绝缘层包括下绝缘层和设置在所述下绝缘层上的上绝缘层，所述下绝缘层在所述接触孔处被底切， 并且金属层填充在下绝缘层被切下的部分。

公开(公告)号：US20140045121A1

公开(公告)日：2014-02-13

申请号：US13765132

申请日：2013-02-12

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Ki-Beom LEE ,  Chang-Hoon KIM ,  Su-Yeon SIM ,  Sang-Hyn LEE ,  Hi-Kuk LEE

IPC: G03F7/033 ,  G03F7/20 ,  G03F7/032

CPC classification number: G03F7/033 ,  G03F7/0007 ,  G03F7/028 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/105 ,  G03F7/20 ,  G03F7/2051

Abstract: A photoresist composition including: about 5% by weight to about 10% by weight of a binder resin; about 5% by weight to about 10% by weight of a photo-polymerization monomer; about 1% by weight to about 5% by weight of a photo initiator, which is activated by a light having a peak wavelength from about 400 nm to about 410 nm; about 5% by weight to about 10% by weight of a black-coloring agent, each based on a total weight of the photoresist composition; and a solvent.

Abstract translation: 一种光致抗蚀剂组合物，其包含：约5重量％至约10重量％的粘合剂树脂; 约5重量％至约10重量％的光聚合单体; 约1重量％至约5重量％的光引发剂，其由具有约400nm至约410nm的峰值波长的光活化; 约5重量％至约10重量％的黑色着色剂，各自基于光致抗蚀剂组合物的总重量; 和溶剂。

公开(公告)号：US20160077449A1

公开(公告)日：2016-03-17

申请号：US14635339

申请日：2015-03-02

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Jung-Chul HEO ,  Hi-Kuk LEE ,  Jae-Hyuk CHANG ,  Sang-Hyun LEE ,  Jung-In PARK ,  Sang-Hyun YUN ,  Ki-Beom LEE ,  Hyun-Seok KIM ,  Kab-Jong SEO ,  Jun-Ho SIM ,  Byoung-Min YUN ,  Sang-Don JANG ,  Jae-Young JANG ,  Chang-Hoon KIM

IPC: G03F7/20 ,  H01L27/12 ,  H01L29/786

CPC classification number: G03F7/70508 ,  G03F7/2022 ,  G03F7/2051 ,  G03F7/702 ,  G03F7/70291 ,  G03F7/70391 ,  H01L27/1222 ,  H01L27/124 ,  H01L27/1259 ,  H01L29/78669 ,  H01L29/78693 ,  H01L29/78696

Abstract: A maskless exposure device includes an exposure head including a digital micro-mirror device. The digital micro-mirror device is configured to transmit a source beam applied from an exposure source to a substrate. A system control part is configured to control the digital micro-mirror device by using a graphic data system file. The graphic data system file includes data for forming a source electrode, a drain electrode and a channel portion disposed between the source electrode and the drain electrode. The graphic system file includes data for forming the channel portion extending in a diagonal direction with respect to a scan direction of the exposure head.

Abstract translation: 无掩模曝光装置包括具有数字微镜装置的曝光头。 数字微镜装置被配置为将从曝光源施加的源光束传输到衬底。 系统控制部分被配置为通过使用图形数据系统文件来控制数字微镜装置。 图形数据系统文件包括用于形成源电极，漏电极和设置在源电极和漏电极之间的沟道部分的数据。 图形系统文件包括用于形成相对于曝光头的扫描方向沿对角线方向延伸的通道部分的数据。

公开(公告)号：US20150049316A1

公开(公告)日：2015-02-19

申请号：US14226621

申请日：2014-03-26

Applicant: Samsung Display Co., Ltd.

Inventor： Cha-Dong KIM ,  Hoon KANG ,  Chang-Hoon KIM ,  Sang-Hyun YUN ,  Jung-In PARK ,  Woo-Yong SUNG ,  Ki-Beom LEE ,  Hi-Kuk LEE ,  Jae-Hyuk CHANG

IPC: G03F7/20

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/7055

Abstract: An exposure apparatus includes a light source, an illuminating member, a projecting member, a stage, an inspecting member, and an information processing member. The light source is configured to provide a light in accordance with a pulse event generation (PEG) representing a period of light radiation. The illuminating member is configured to change the light into point lights. The projecting member is configured to project the point lights according to a photoresist shape extending in various directions. The point lights are projected on the stage. The inspecting member is configured to inspect a photoresist pattern formed by the projected point lights. The information processing member is configured to analyze different photoresist patterns corresponding to different PEGs to select one PEG from the different PEGs. The one PEG being associated with a minimum error in the various directions.

Abstract translation: 曝光装置包括光源，照明构件，突出构件，台，检查构件和信息处理构件。 光源被配置为根据表示光辐射周期的脉冲事件生成（PEG）提供光。 照明构件被配置为将光改变为点光。 突出构件被配置为根据在各个方向上延伸的光致抗蚀剂形状来投射点光源。 点灯投射在舞台上。 检查构件被配置为检查由投影点光形成的光致抗蚀剂图案。 信息处理构件被配置为分析对应于不同PEG的不同光刻胶图案，以从不同的PEG中选择一个PEG。 一个PEG与各个方向上的最小误差相关联。