公开(公告)号：US09201265B2

公开(公告)日：2015-12-01

申请号：US14282310

申请日：2014-05-20

Applicant: Samsung Display Co., Ltd.

Inventor： Yong Jun Park ,  Young Suk Lee ,  Jong Soo Lee

IPC: G02F1/1335 ,  G02F1/1343

CPC classification number: G02F1/133528 ,  G02F1/133377 ,  G02F1/133536 ,  G02F1/133707 ,  G02F1/1341 ,  G02F1/134309 ,  G02F2001/133548

Abstract: An exemplary embodiment provides a liquid crystal display including: a substrate; a first wire grid polarizer; a thin film transistor; a pixel electrode; a roof layer; and a plurality of microcavities. The substrate has a bottom surface and a top surface. The first wire grid polarizer is disposed on the bottom surface of the substrate. The thin film transistor is disposed on the top surface of the substrate. The pixel electrode is connected to the thin film transistor. The roof layer is disposed to face the pixel electrode. The plurality of microcavities having injection holes are formed between the pixel electrode and the roof layer, the microcavities forming a liquid crystal layer containing liquid crystal molecules.

Abstract translation: 一个示例性实施例提供一种液晶显示器，包括：基板; 第一线栅偏振器; 薄膜晶体管; 像素电极; 屋顶层; 和多个微腔。 衬底具有底表面和顶表面。 第一线栅偏振器设置在基板的底表面上。 薄膜晶体管设置在基板的顶表面上。 像素电极连接到薄膜晶体管。 屋顶层设置成面对像素电极。 在像素电极和屋顶层之间形成具有注入孔的多个微腔，形成含有液晶分子的液晶层的微腔。

公开(公告)号：US09292914B2

公开(公告)日：2016-03-22

申请号：US14207273

申请日：2014-03-12

Applicant: Samsung Display Co., Ltd.

Inventor： Young Suk Lee ,  Yong Jun Park ,  Jong Soo Lee

IPC: G06K9/00 ,  G06T7/00

CPC classification number: G06T7/001 ,  G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A device and method for measuring a critical dimension of a pattern on a display substrate is disclosed. In one aspect, the device includes a region of interest (ROI) setting unit setting a region of interest in image data, determining whether the region of interest is larger than a reference region, and generating a pattern image based on the region of interest. The device also includes a design file memory storing a plurality of design patterns, a matching unit matching the pattern image to one of design patterns, and a measurement unit measuring the critical dimension of the pattern in the pattern image. The ROI setting unit selects the image data as the pattern image and outputs the pattern image to the matching unit when the region of interest is larger than the reference region.

Abstract translation: 公开了一种用于测量显示基板上的图案的临界尺寸的装置和方法。 一方面，该装置包括设置图像数据中的感兴趣区域的感兴趣区域（ROI）设置单元，确定感兴趣区域是否大于参考区域，以及基于感兴趣区域生成图案图像。 该设备还包括存储多个设计图案的设计文件存储器，将图案图像与设计图案中的一个匹配的匹配单元，以及测量图案图案中图案的临界尺寸的测量单元。 ROI设置单元选择图像数据作为图案图像，并且当感兴趣的区域大于参考区域时，将图案图像输出到匹配单元。

公开(公告)号：US20150098643A1

公开(公告)日：2015-04-09

申请号：US14207273

申请日：2014-03-12

Applicant: Samsung Display Co., Ltd.

Inventor： Young Suk Lee ,  Yong Jun Park ,  Jong Soo Lee

IPC: G06T7/00

CPC classification number: G06T7/001 ,  G06T7/0006 ,  G06T2207/10061 ,  G06T2207/30148

Abstract: A device and method for measuring a critical dimension of a pattern on a display substrate is disclosed. In one aspect, the device includes a region of interest (ROI) setting unit setting a region of interest in image data, determining whether the region of interest is larger than a reference region, and generating a pattern image based on the region of interest. The device also includes a design file memory storing a plurality of design patterns, a matching unit matching the pattern image to one of design patterns, and a measurement unit measuring the critical dimension of the pattern in the pattern image. The ROI setting unit selects the image data as the pattern image and outputs the pattern image to the matching unit when the region of interest is larger than the reference region.

Abstract translation: 公开了一种用于测量显示基板上的图案的临界尺寸的装置和方法。 一方面，该装置包括设置图像数据中的感兴趣区域的感兴趣区域（ROI）设置单元，确定感兴趣区域是否大于参考区域，以及基于感兴趣区域生成图案图像。 该设备还包括存储多个设计图案的设计文件存储器，将图案图像与设计图案中的一个匹配的匹配单元，以及测量图案图案中图案的临界尺寸的测量单元。 ROI设置单元选择图像数据作为图案图像，并且当感兴趣的区域大于参考区域时，将图案图像输出到匹配单元。

公开(公告)号：US11984368B2

公开(公告)日：2024-05-14

申请号：US17350738

申请日：2021-06-17

Applicant: Samsung Display Co., LTD.

Inventor： Seung Cheol Ko ,  Young Suk Lee ,  Yong Jun Park

IPC: H01L21/66 ,  H01L27/15 ,  H01L33/24 ,  H01L33/62

CPC classification number: H01L22/32 ,  H01L27/156 ,  H01L33/24 ,  H01L33/62

Abstract: A display device includes a light emitting area and a sub-area disposed at a side of the light emitting area, a measurement area disposed in the sub-area, measurement patterns and a first electrode extension portion being disposed in the measurement area, a first electrode and a second electrode that are disposed in the light emitting area and spaced apart from each other, and face each other, a first insulating layer disposed on the first electrode and the second electrode, at least a part of the first insulating layer being disposed on the first electrode extension portion, and at least one light emitting element having ends disposed on the first electrode and the second electrode in the light emitting area. The measurement area includes a first measurement area in which a first measurement hole exposing a part of an upper surface of the first electrode extension portion is disposed.

公开(公告)号：US09123276B2

公开(公告)日：2015-09-01

申请号：US13834858

申请日：2013-03-15

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： Yong Jun Park ,  HyungJun Kim ,  Young Suk Lee ,  Jongsoo Lee

IPC: G01B11/14 ,  G09G3/00 ,  G03F7/20

CPC classification number: G09G3/006 ,  G03F7/70625

Abstract: A display panel includes a plurality of pixel areas and at least one inspection area. An incident light is irradiated onto an inspection pattern disposed in the inspection area and a reflection light reflected by the inspection pattern is detected. An optical critical dimension of the inspection pattern is calculated from the reflection light, and a dimension of a pixel pattern disposed in each pixel area is calculated from the optical critical dimension of the inspection pattern. Accordingly, the dimension of the pixel pattern may be indirectly measured from the inspection pattern.

Abstract translation: 显示面板包括多个像素区域和至少一个检查区域。 将入射光照射到设置在检查区域中的检查图案，并检测由检查图案反射的反射光。 根据反射光计算检查图案的光临界尺寸，并且从检查图案的光临界尺寸计算设置在每个像素区域中的像素图案的尺寸。 因此，可以从检查图案间接测量像素图案的尺寸。