公开(公告)号：US20240242980A1

公开(公告)日：2024-07-18

申请号：US18390323

申请日：2023-12-20

Applicant: Samsung Display Co., LTD.

Inventor： Yonghyun KIM ,  Kyu-Bum KIM ,  Seung Ho MYOUNG ,  Yeongmin KIM ,  Ju Yeong YUN ,  Jungwoo CHOI

IPC: H01L21/67 ,  H01L21/677 ,  H01L21/687

CPC classification number: H01L21/67069 ,  H01L21/6719 ,  H01L21/67706 ,  H01L21/68764

Abstract: A substrate etching apparatus includes: a stage moving part for supporting a substrate carrier to which a substrate is attached in a vertical direction and for moving the substrate carrier to which the substrate is attached in a horizontal direction; a substrate carrier loading part positioned in a first region in the horizontal direction and for loading the substrate carrier to which the substrate is attached to the stage moving part; and an etching part positioned in a second region adjacent to the first region in the horizontal direction and for etching the substrate attached to the substrate carrier supported on the stage moving part in the vertical direction.