公开(公告)号：US20240045339A1

公开(公告)日：2024-02-08

申请号：US18200238

申请日：2023-05-22

Applicant: Samsung Display Co., LTD.

Inventor： Soon-Hwan So ,  Tae Joon Kim ,  Wonseon Yu ,  Bong_Yeon Kim ,  Sung-Woo Cho

IPC: G03F7/20 ,  G03F7/09 ,  G03F7/004

CPC classification number: G03F7/70466 ,  G03F7/70508 ,  G03F7/091 ,  G03F7/0045 ,  G03F7/70791

Abstract: A photomask includes a first light-transmitting portion including first and second main patterns spaced apart from each other in a first direction, a second light-transmitting portion having a light transmittance lower than a light transmittance of the first light-transmitting portion and including a first auxiliary pattern disposed between the first and second main patterns and extending in a second direction crossing the first direction, a second auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the first main pattern interposed therebetween and surrounding the first main pattern, and a third auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the second main pattern interposed therebetween and surrounding the second main pattern, and a light shielding portion surrounding the first and second light-transmitting portions.