DEPOSITION APPARATUS
    2.
    发明公开

    公开(公告)号:US20240060172A1

    公开(公告)日:2024-02-22

    申请号:US18203702

    申请日:2023-05-31

    CPC classification number: C23C14/50 C23C14/042 C23C14/24

    Abstract: A deposition apparatus for depositing a deposition material on a base substrate disposed on a mask, includes: a mask assembly including a mask frame which defines an opening therein and surrounds the opening, and the mask disposed on the mask frame; an electrostatic chuck disposed on the base substrate; and a plate disposed on the electrostatic chuck. The electrostatic chuck includes a plurality of magnetic bodies, and a magnetic property of at least one magnetic body among the plurality of magnetic bodies is different from a magnetic property of remaining magnetic bodies except for the at least one magnetic body among the plurality of magnetic bodies.

    ELECTROSTATIC CHUCK AND THIN FILM DEPOSITION APPARATUS INCLUDING THE SAME

    公开(公告)号:US20240322713A1

    公开(公告)日:2024-09-26

    申请号:US18396845

    申请日:2023-12-27

    CPC classification number: H02N13/00 B05C13/00 B05C21/005

    Abstract: A thin film deposition apparatus according to an embodiment includes a chamber, a deposition source disposed in a chamber and that supplies a deposition material to the substrate, a mask assembly comprising pattern holes through which the deposition material passes, and an electrostatic chuck facing the mask assembly and that fixes the substrate. The electrostatic chuck comprises a body that supports the substrate, an insulating layer disposed on the body, a first electrode disposed in the insulating layer and spaced apart from the body by a first distance, a second electrode disposed in the insulating layer and spaced apart from the body by a second distance, and a conductive layer disposed in the insulating layer and spaced apart from the body by a third distance. The first electrode and the second electrode are supplied with different voltages, and the third distance is greater than the first distance.

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