公开(公告)号：US20230152691A1

公开(公告)日：2023-05-18

申请号：US17821820

申请日：2022-08-24

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Katsuhiro KOMURO ,  Saki KATO ,  Koji ICHIKAWA

IPC分类号： G03F7/004 ,  C07D307/68 ,  C07D307/00 ,  C07D307/56 ,  C07D321/10 ,  C07D333/40 ,  C07D333/28

CPC分类号： G03F7/0045 ,  C07D307/68 ,  C07D307/00 ,  C07D307/56 ,  C07D321/10 ,  C07D333/40 ,  C07D333/28

摘要： Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:




wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4, m5 and m6 represent an integer of 0 to 3, m7 represents an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5, and AI− represents an organic anion.

公开(公告)号：US20230266666A1

公开(公告)日：2023-08-24

申请号：US17896138

申请日：2022-08-26

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Katsuhiro KOMURO ,  Saki KATO ,  Koji ICHIKAWA

IPC分类号： G03F7/004 ,  C07D307/00 ,  C07D333/76 ,  C07D321/10 ,  C07D409/12 ,  C08F220/18

CPC分类号： G03F7/0045 ,  C07D307/00 ,  C07D321/10 ,  C07D333/76 ,  C07D409/12 ,  C08F220/1808 ,  C08F220/1818

摘要： Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:





wherein R4 to R9 each represent a halogen atom, a haloalkyl group, etc., A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, —CH2— included in the group may be replaced by —O—, —CO—, —S—, etc., X4, X5 and X6 each represent —O— or —S—, m1 and m7 represent an integer of 0 to 5, m2, m3, m8 and m9 represent an integer of 0 to 4, m4 to m6 represent an integer of 0 to 3, 0 ≤ m1 + m7 ≤ 5, 0 ≤ m2 + m8 ≤ 4, 0 ≤ m3 + m9 ≤ 4, one or more of m1, m2 and m3 represent an integer of 1 or more, X7 represents a single bond, —CH2—, —O—, —S—, etc., and Al— represents an organic anion.

公开(公告)号：US20230139896A1

公开(公告)日：2023-05-04

申请号：US17896273

申请日：2022-08-26

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Katsuhiro KOMURO ,  Saki KATO ,  Koji ICHIKAWA

IPC分类号： G03F7/004

摘要： Provided are a salt capable of producing a resist pattern with satisfactory CD uniformity (CDU), and a resist composition including the same. Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same: wherein R4, R5, R7 and R8 each represent a halogen atom, a haloalkyl group, etc., A1 and A2 each represent a hydrocarbon group, the group may have a substituent, —CH2— in the group may be replaced by —O—, —CO—, —S—, —SO2—, etc., X3 and X4 each represent —O— or —S—, m1 present an integer of 1 to 5, m2 and m8 represent an integer of 0 to 5, m4 and m5 represent an integer of 0 to 3, m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, and AI− represents an organic anion.