公开(公告)号：US09012957B2

公开(公告)日：2015-04-21

申请号：US14017024

申请日：2013-09-03

Applicant: STMicroelectronics S.A.

Inventor： Vincent Quenette

IPC: H01L29/76 ,  H01L29/78 ,  H01L29/66 ,  H01L29/423

CPC classification number: H01L29/7813 ,  H01L29/4236 ,  H01L29/66734 ,  H01L29/66787 ,  H01L29/66795 ,  H01L29/7851

Abstract: A MOS transistor including a U-shaped channel-forming semiconductor region and source and drain regions having the same U shape located against the channel-forming region on either side thereof, the internal surface of the channel-forming semiconductor region being coated with a conductive gate, a gate insulator being interposed.

Abstract translation: 一种MOS晶体管，包括U形沟道形成半导体区域和具有相同U形的源极和漏极区域，其位于其任一侧上的沟道形成区域，沟道形成半导体区域的内表面涂覆有导电 栅极，插入栅极绝缘体。

公开(公告)号：US20140061723A1

公开(公告)日：2014-03-06

申请号：US14017024

申请日：2013-09-03

Applicant: STMicroelectronics S.A.

Inventor： Vincent Quenette

IPC: H01L29/78 ,  H01L29/66

CPC classification number: H01L29/7813 ,  H01L29/4236 ,  H01L29/66734 ,  H01L29/66787 ,  H01L29/66795 ,  H01L29/7851

Abstract: A MOS transistor including a U-shaped channel-forming semiconductor region and source and drain regions having the same U shape located against the channel-forming region on either side thereof, the internal surface of the channel-forming semiconductor region being coated with a conductive gate, a gate insulator being interposed.

Abstract translation: 一种MOS晶体管，包括U形沟道形成半导体区域和具有相同U形的源极和漏极区域，其位于其任一侧上的沟道形成区域，沟道形成半导体区域的内表面涂覆有导电 栅极，插入栅极绝缘体。