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    Field ionizer and field emission cathode structures and methods of production
    1.
    发明授权
    Field ionizer and field emission cathode structures and methods of production 失效
    现场离子和场发射阴极结构和生产方法

    公开(公告)号：US3665241A

    公开(公告)日：1972-05-23

    申请号：US3665241D

    申请日：1970-07-13

    Applicant: STANFORD RESEARCH INST

    Inventor： SPINDT CHARLES A ,  HEYNICK LOUIS N

    IPC: H01J1/304 ,  H01J35/06 ,  H01J49/16 ,  H01T23/00 ,  H01J1/30

    CPC classification number: H01J49/168 ,  H01J1/3042 ,  H01J27/26 ,  H01J35/065 ,  H01J2237/0807 ,  H01T23/00

    Abstract: Field-forming devices primarily useful as field ionizers and field emission cathodes and having as a basic element an array of closely spaced cones with sharp points supported on a substrate (in the most usual case conductive or semiconductive) are disclosed. Preferably, the field-forming structure is completed by a screen-like structure, e.g. as fine mesh screen, insulatively supported above the points with the center of apertures in the screen substantially aligned with the longitudinal axis of corresponding cones. A novel method of forming such structures includes placing a screen with a mesh corresponding to the desired number and packing density of sharp conical points in close proximity to, or in contact with, the substrate and projecting material through the screen onto the substrate whereby sharp cones of the material are formed on the substrates.

    Charged particle apodized pattern imaging and exposure system
    2.
    发明授权
    Charged particle apodized pattern imaging and exposure system 失效
    带电粒子变迹图案成像和曝光系统

    公开(公告)号：US3924136A

    公开(公告)日：1975-12-02

    申请号：US55064275

    申请日：1975-02-18

    Applicant: STANFORD RESEARCH INST

    Inventor： HEYNICK LOUIS N ,  WESTERBERG EUGENE R ,  BAHR ALFRED J ,  LEE ROBERT E

    IPC: H01J37/30 ,  H01J37/12

    CPC classification number: H01J37/3007

    Abstract: A charged particle beam pattern forming and imaging system for producing an apodized pattern is disclosed in which charged particles from one or more sources impinge upon an imaging plate. A high voltage electrical source is connected between the imaging plate and a target to produce a strong electrical field therebetween. The imaging plate contains one or more long and narrow slits. Each slit functions as a lens to yield one image of itself for each particle source, each image being converged only along the width of the slit (convergence in one dimension). A relatively narrow apodizing mask member is positioned between the particle source and the target (preferably between source and imaging plate) so that the mask divides the image of each slit lens at the target. The number of particle sources displaced in a direction transverse to the long dimension of the slit lenses determines the number of parallel slits imaged at the target, and their relative orthogonal displacement determines the distance between the parallel slit images at the target. Relative displacement of each particle source in a direction parallel with the length of the slit lenses determines the placement of each source relative to the apodizing mask and, consequently, the location of the division of the slit image formed by each source. The width (dimension orthogonal to the slit lens) of each slit image is proportional to the dimension transverse to the slit of the particle source used to produce that slit image, and the intensity of the particle stream used to produce that slit image is proportional to the length (dimension parallel with the slit lens) of the particle source, so slit images of varying widths but constant intensity are produced by corresponding variations of the transverse widths of the particle sources while utilizing particle sources of equal lengths.

    Abstract translation: 公开了一种用于产生变迹图案的带电粒子束图案形成和成像系统，其中来自一个或多个源的带电粒子撞击成像板。 高压电源连接在成像板和靶之间，以在它们之间产生强电场。 成像板包含一个或多个长而狭窄的狭缝。 每个狭缝用作透镜以为每个粒子源产生其自身的一个图像，每个图像仅沿着狭缝的宽度会聚（一维收敛）。 相对窄的变迹掩模构件位于颗粒源和靶之间（优选地在源和成像板之间），使得掩模将每个狭缝透镜的图像划分在目标处。 在与狭缝透镜的长尺寸横切的方向上移动的粒子源的数量决定了在目标处成像的平行狭缝的数量，并且它们的相对正交位移决定了目标处的平行狭缝图像之间的距离。 每个粒子源在与狭缝透镜的长度平行的方向上的相对位移决定了每个源相对于变迹掩模的位置，并且因此确定了由每个源形成的狭缝图像的划分的位置。 每个狭缝图像的宽度（与狭缝透镜垂直的尺寸）与用于产生该狭缝图像的粒子源的狭缝的横向成比例，并且用于产生该狭缝图像的粒子流的强度与 粒子源的长度（与狭缝透镜的尺寸平行），因此利用相同长度的粒子源的颗粒源的横向宽度的相应变化产生变化宽度但恒定强度的狭缝图像。

    Charged particle pattern imaging and exposure system
    3.
    发明授权
    Charged particle pattern imaging and exposure system 失效
    充电颗粒图像成像和曝光系统

    公开(公告)号：US3614423A

    公开(公告)日：1971-10-19

    申请号：US3614423D

    申请日：1970-09-21

    Applicant: STANFORD RESEARCH INST

    Inventor： HEYNICK LOUIS N ,  WESTERBERG EUGENE R

    IPC: G03G15/32 ,  H01J37/12 ,  H01J37/30 ,  H05K3/02

    CPC classification number: H01J37/3007 ,  G03G15/321 ,  H01J37/12 ,  H05K3/027 ,  H05K2203/092 ,  H05K2203/107

    Abstract: A charged-particle beam-pattern forming and imaging system is disclosed in which charged particles from one or more sources impinge upon an imaging plate. A high-voltage electrical source is connected between the imaging plate and a target to produce a strong electrical field therebetween. The imaging plate contains one or more long and narrow slits which may be straight or curved to any desired configuration. Each slit functions as a lens to yield one image of itself for each particle source, each image being converged only along the width of the slit (one-dimension convergence). Proper choices of the pattern of the particle sources and the slit arrangement in the imaging plate yield a variety of patterns useful in many applications, such as closely spaced parallel lines for diffraction gratings, interdigital patterns for microwave devices, meander lines, and interconnections for integrated circuits, by formation of the entire patterns at once rather than by the scanning or other sequential techniques used heretofore.

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