公开(公告)号：US09728880B2

公开(公告)日：2017-08-08

申请号：US15221549

申请日：2016-07-27

申请人： SMK Corporation

发明人： Koichiro Ejiri ,  Haruhiko Kondo ,  Rie Abe ,  Katsushi Oishi ,  Hidemasa Sakurada

IPC分类号： H01R13/53 ,  H01R13/03

CPC分类号： H01R13/03 ,  H01R13/04 ,  H01R13/53

摘要： The present invention is intended to provide a contact contacting structure for hot-line connection between contacts configured such that the occurrence of arc discharge between contacts is suppressed by a simple configuration. At least one of contact/separation contact surfaces in a pair opposed to each other at the contact/separation position between a first contact and a second contact is covered with an oxide film. At the time of contact or separation of the first contact and the second contact, the oxide film as an insulator intervenes between the paired contact/separation contact surfaces to decrease energy accumulated between the first contact and the second contact at the instant of contact or separation of the two contacts, thereby suppressing the occurrence of arc discharge.