公开(公告)号：US09499897B2

公开(公告)日：2016-11-22

申请号：US13621337

申请日：2012-09-17

申请人： SHINCRON CO., LTD.

发明人： Yousong Jiang ,  Ichiro Shiono ,  Mitsuhiro Miyauchi ,  Takaaki Aoyama ,  Tatsuya Hayashi ,  Ekishu Nagae

IPC分类号： B05C13/00 ,  C23C14/04 ,  C23C16/458 ,  C23C14/24 ,  C23C16/04 ,  C23C14/50

CPC分类号： C23C14/042 ,  C23C14/04 ,  C23C14/24 ,  C23C14/50 ,  C23C14/505 ,  C23C16/04 ,  C23C16/042 ,  C23C16/4584

摘要： Provided is a thin film forming apparatus for reducing operation time and cost by forming a film only on a specific portion on substrates. A substrate holding mechanism provided in the apparatus includes: substrate holding members holding substrates in a manner that a part of a non-film forming portion of a substrate overlaps the other substrate and a film forming portion is exposed, a support member supporting the substrate holding members, and a rotation member which rotates the support member. The substrate holding members include: holding surfaces holding the substrates and disposed between a film forming source and the substrates, step portions formed between the holding surfaces in a manner that ends of the substrates respectively contact with the step portions, and opening portions formed on the holding surfaces of the portion corresponding to the film forming portion when the ends of the substrates contact with the step portions.

摘要翻译： 提供了一种通过仅在基板上的特定部分上形成膜来减少操作时间和成本的薄膜形成装置。 设置在该设备中的基板保持机构包括：基板保持部件，其以基板的非成膜部分的一部分与另一个基板重叠并且成膜部分露出的方式保持基板;支撑部件，其支撑基板保持 构件，以及使支撑构件旋转的旋转构件。 基板保持构件包括：保持基板并且配置在成膜源与基板之间的保持面，以与基板的端部分别接触的台阶部分之间形成在保持面之间的台阶部， 当基板的端部与台阶部分接触时，保持对应于成膜部分的部分的表面。