Leadless semiconductor packages, leadframes therefor, and methods of making

    公开(公告)号:US10756006B2

    公开(公告)日:2020-08-25

    申请号:US16230494

    申请日:2018-12-21

    摘要: A leadframe includes a frame, a die pad, a contact including a flank adjacent to the frame, a first tie bar between the frame and die pad, and a second tie bar between the die pad and contact. The leadframe is disposed over a carrier. A semiconductor die is disposed over the die pad. An encapsulant is deposited over the leadframe and semiconductor die including between the carrier and half-etched portions of the leadframe. A first trench is formed in the encapsulant to remove a portion of the frame and expose the flank of the contact. A conductive layer is formed over the flank by electroplating. A second trench is formed in the encapsulant through the second tie bar after forming the conductive layer.

    Leadless semiconductor packages, leadframes therefor, and methods of making

    公开(公告)号:US10199311B2

    公开(公告)日:2019-02-05

    申请号:US15415504

    申请日:2017-01-25

    摘要: A leadframe includes a frame, a die pad, a contact including a flank adjacent to the frame, a first tie bar between the frame and die pad, and a second tie bar between the die pad and contact. The leadframe is disposed over a carrier. A semiconductor die is disposed over the die pad. An encapsulant is deposited over the leadframe and semiconductor die including between the carrier and half-etched portions of the leadframe. A first trench is formed in the encapsulant to remove a portion of the frame and expose the flank of the contact. A conductive layer is formed over the flank by electroplating. A second trench is formed in the encapsulant through the second tie bar after forming the conductive layer.

    Wafer-scale marking systems and related methods

    公开(公告)号:US09659876B1

    公开(公告)日:2017-05-23

    申请号:US15203599

    申请日:2016-07-06

    IPC分类号: H01L21/302 H01L23/544

    摘要: A method of wafer-scale marking includes coupling a first marking mask over a semiconductor wafer having unsingulated semiconductor devices thereon. The first marking mask has a plurality of first stencils therethrough and a surface of the wafer is plasma etched through the first stencils to form first markings in the surface. A second marking mask is coupled over the surface and includes a plurality of second stencils therethrough. The surface is plasma etched through the second stencils to form second markings in the surface. In implementations the first marking mask and second marking mask are simultaneously coupled over the surface and the first markings and second markings are simultaneously formed. In implementations a plurality of first windows of the first marking mask are aligned with the plurality of second stencils while a plurality of second windows of the second marking mask are aligned with the plurality of first stencils.

    Carrier tape with standoff units
    7.
    发明授权

    公开(公告)号:US10399756B2

    公开(公告)日:2019-09-03

    申请号:US16126614

    申请日:2018-09-10

    IPC分类号: B65D73/02

    摘要: A carrier tape system, in some embodiments, comprises: a tape; a series of index holes along a length of said tape; a series of pockets along said length; a first series of standoff units along said length; and a second series of standoff units along said length, wherein the series of pockets is positioned between the first series of standoff units and the second series of standoff units, wherein the standoff units create a clearance space between the bottom surfaces of said pockets and the tape when said tape is wound on a reel.

    Carrier tape with standoff units
    9.
    发明授权

    公开(公告)号:US10093468B2

    公开(公告)日:2018-10-09

    申请号:US15158424

    申请日:2016-05-18

    IPC分类号: B65D73/02

    摘要: A carrier tape system, in some embodiments, comprises: a tape; a series of index holes along a length of said tape; a series of pockets along said length; a first series of standoff units along said length; and a second series of standoff units along said length, wherein the series of pockets is positioned between the first series of standoff units and the second series of standoff units, wherein the standoff units create a clearance space between the bottom surfaces of said pockets and the tape when said tape is wound on a reel.