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公开(公告)号：US20230032518A1
公开(公告)日：2023-02-02
申请号：US17859000
申请日：2022-07-07
申请人： SEMES CO., LTD
发明人： Su Hyung LEE , Ga Yeon KIM , Sung Ho LEE , Ju Yong JANG
摘要： An apparatus and a method for non-destructive inspection of quality of an electrostatic chuck are disclosed. The apparatus includes a measurement unit for measuring a first capacitance of a dielectric layer of the electrostatic chuck and for measuring a second capacitance of an electrode installed in the dielectric layer; and a control unit configured to evaluate quality of the electrode, based on the first capacitance and the second capacitance.
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公开(公告)号：US20230377932A1
公开(公告)日：2023-11-23
申请号：US18311999
申请日：2023-05-04
申请人： SEMES CO., LTD.
发明人： Dongchan LEE , Su Hyung LEE
IPC分类号： H01L21/683
CPC分类号： H01L21/6833 , H01J37/32724
摘要： A substrate support device according to one aspect of the present invention includes a seating plate part on which a substrate is seated, a shaft part coupled to a lower portion of the seating plate part to support the seating plate part, and a gap flange part coupled to the shaft part or the seating plate part to define a thermal insulation gap between the shaft part and the gap flange part and between the seating plate part and the gap flange part, the gap flange part including a gas inlet port and a gas outlet port so that cooling gas circulates in the thermal insulation gap.
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公开(公告)号：US20210147287A1
公开(公告)日：2021-05-20
申请号：US17097066
申请日：2020-11-13
申请人： SEMES CO., LTD.
发明人： Su Hyung LEE
摘要： Disclosed is a method of treating the surface of a quartz member. The method can remove a masking material generated by a chemical reaction between the quartz member and an etching solution, thereby completely removing scratches on the surface of the quartz member without interrupting the treatment process unlike existing technologies. The method also embosses the surface of the quartz member, thereby increasing the frictional resistance and surface roughness of the surface of the quartz member depending on the shape or density of protrusions on the surface. In addition, the method prevents deposits on the surface of the quartz member from peeling off.
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公开(公告)号：US20240071733A1
公开(公告)日：2024-02-29
申请号：US18167303
申请日：2023-02-10
申请人： SEMES CO., LTD.
发明人： Su Hyung LEE , Ju Yong JANG , Hiroaki HORI
IPC分类号： H01J37/32
CPC分类号： H01J37/32724 , H01J37/32642
摘要： The inventive concept provides a substrate treating apparatus. The substrate treating apparatus includes a housing having a treating space for treating a substrate; a support unit positioned at the treating space; and a plasma source for generating a plasma by exciting a gas supplied to the treating space, and wherein the support unit includes: a first plate at which the substrate is positioned at a top side; a second plate which is positioned at a bottom side of the first plate; and an adhesive layer for adhering the first plate and the second plate to each other, and wherein a top surface of the second plate is divided into a central region including a center of the top surface and an edge region surrounding the central region, and a height of the adhesive layer filled between a bottom surface of the first plate and the top surface of the second plate is substantially different at the central region and at the edge region.
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公开(公告)号：US20180333755A1
公开(公告)日：2018-11-22
申请号：US15982005
申请日：2018-05-17
申请人： SEMES CO., LTD.
发明人： Su Hyung LEE , Youngje Um
CPC分类号： B08B7/04 , B08B7/0021 , B08B7/0071 , H01L21/67051 , H01L21/67063
摘要： Provide are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus comprises a chamber, a substrate supporting member which is positioned in the chamber to support the substrate, a spray member which supplies a rinse liquid to the substrate, a depressurizing line which is used to depressurize the chamber, and a controller which vaporizes the rinse liquid by depressurizing the chamber through the depressurizing line after supplying the rinse liquid in a liquid phase.
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