GAS BARRIER FILM AND MANUFACTURING METHOD THEREFOR
    2.
    发明申请
    GAS BARRIER FILM AND MANUFACTURING METHOD THEREFOR 审中-公开
    气体阻隔膜及其制造方法

    公开(公告)号:US20170022342A1

    公开(公告)日:2017-01-26

    申请号:US15039355

    申请日:2014-11-10

    摘要: The present invention relates to a gas barrier film and a manufacturing method therefor, the gas barrier film comprising: a base; and a barrier layer formed on one surface of the base, wherein the barrier layer has a nitrogen (N) atomic percent of about 1% to about 6%. The gas barrier film, according to the present invention, has an excellent gas barrier property, scratch resistant property, flexibility, transparency and crack prevention effect, and the method for manufacturing the same can be performed by non-vacuum wet coating, and thus a manufacturing time is short, and process performance is excellent.

    摘要翻译: 阻气膜及其制造方法技术领域本发明涉及阻气膜及其制造方法,所述阻气膜包括:基材; 以及形成在所述基底的一个表面上的阻挡层,其中所述阻挡层具有约1%至约6%的氮(N)原子百分比。 根据本发明的阻气膜具有优异的阻气性,耐刮擦性,柔韧性,透明性和防裂效果,并且其制造方法可以通过非真空湿式涂布进行,因此, 制造时间短,加工性能优异。