公开(公告)号：US11143974B1

公开(公告)日：2021-10-12

申请号：US17021120

申请日：2020-09-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yongseung Moon ,  Sungyong Cho

IPC: G03F7/20 ,  G03F1/66 ,  H01L21/673

Abstract: A method of cleaning a reticle pod and an exposure method, the method of cleaning the reticle pod including receiving the reticle pod that includes an inner pod and an outer pod surrounding the inner pod; disassembling the inner pod from the outer pod; inspecting a surface of a base plate of the inner pod to detect defects; performing a local plasma cleaning process at a defect location on the surface of the base plate; performing a wet cleaning process on the inner pod; and reassembling the inner pod to the outer pod.

公开(公告)号：US10831115B1

公开(公告)日：2020-11-10

申请号：US16774543

申请日：2020-01-28

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Yongseung Moon ,  Sungyong Cho

IPC: G03F7/20 ,  H01L21/673

Abstract: Disclosed are reticle management methods and semiconductor device fabrication methods. The reticle management method includes inspecting a reticle using a first inspection method, inspecting a reticle pod storing the reticle using a second inspection method different from the first inspection method, and cleaning the reticle pod when a particle is present on the reticle pod.