公开(公告)号：US20140361168A1

公开(公告)日：2014-12-11

申请号：US14294639

申请日：2014-06-03

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Takashi OGAWA ,  Yasutsugu USAMI ,  Mitsuhiro TOGASHI

IPC: H01J37/26

CPC classification number: H01J37/12 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24485 ,  H01J2237/24564 ,  H01J2237/24592 ,  H01J2237/281

Abstract: An electron beam apparatus includes at least one electron beam column. The at least one beam column includes an electron beam optical system to irradiate an electron beam on a surface of a sample, and a detection system to detect electrons generated from the electron beam. The electron beam optical system includes an object lens to focus the electron beam on a surface of the sample. The object lens includes an electrostatic lens having a first electrode to which a first voltage is applied, a second electrode that is grounded, a third electrode to which a second voltage is applied, and a fourth electrode that is grounded. The first through fourth electrodes sequentially arranged relative to the sample.

Abstract translation: 电子束装置包括至少一个电子束柱。 所述至少一个光束柱包括用于照射样品表面上的电子束的电子束光学系统和用于检测从电子束产生的电子的检测系统。 电子束光学系统包括将电子束聚焦在样品的表面上的物镜。 物镜包括具有第一电极施加第一电压的静电透镜，接地的第二电极，施加第二电压的第三电极和接地的第四电极。 第一至第四电极相对于样品顺序排列。

公开(公告)号：US20140361164A1

公开(公告)日：2014-12-11

申请号：US14295565

申请日：2014-06-04

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Takashi OGAWA ,  Yasutsugu USAMI

IPC: G01N23/22 ,  G01N23/227

CPC classification number: G01N23/227 ,  G01N2223/646

Abstract: An electron beam inspection apparatus includes an electron beam irradiating unit, an electric field generating unit, an energy analyzing unit, and a detection unit. The electron beam irradiating unit irradiates an electron beam on a sample. The electric field generating unit generates an electric field in an irradiation direction of the electron beam. The energy analyzing unit analyzes energy of electrons emitted from the sample caused by emission of the electron beam, where the electrons are accelerated by the electric field. The detection unit detects a depth position of a portion to which the electrons are emitted in the irradiation direction of the electron beam based on a result of the energy analysis.

Abstract translation: 电子束检查装置包括电子束照射单元，电场产生单元，能量分析单元和检测单元。 电子束照射单元将电子束照射在样品上。 电场产生单元在电子束的照射方向产生电场。 能量分析单元分析由电子发射的电子发射的电子的能量，其中电子被电场加速。 基于能量分析的结果，检测单元检测电子束在电子束的照射方向上发射的部分的深度位置。