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公开(公告)号：US20250076144A1
公开(公告)日：2025-03-06
申请号：US18820787
申请日：2024-08-30
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Seunghun KIM , Minjung KIM , Yujin HAN , Taemin KIM , Jiho UH , Jaesung YU , Jinseok LEE
Abstract: A pressure gauge zero point calibration method of a pressure gauge having a diaphragm includes performing a first external zero point calibration at a first time, performing a second external zero point calibration at a second time, the second time occurring after the first time, generating a first usage during a first zero point interval, the first zero point interval spanning from the first time to the second time, determining a usage-based offset slope by dividing a zero point offset difference by the first usage, generating a second usage during a second zero point interval, the second zero point interval spanning from the second time to a third time, the third time occurring after the second time, obtaining a third zero point offset based on the usage-based offset slope and the second usage, and applying the third zero point offset to the pressure gauge, the pressure gauge having a diaphragm.
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公开(公告)号：US20210296153A1
公开(公告)日：2021-09-23
申请号：US17189392
申请日：2021-03-02
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Kihong CHO , Kyuchul SHIM , Chungho CHO , Jiho UH , Jinseok LEE , Namki CHO
IPC: H01L21/683 , H01J37/32
Abstract: A substrate processing apparatus including an electrostatic chuck on which a substrate is mountable; a ring surrounding the electrostatic chuck, the ring including a first coupling groove; and a first floating electrode in the first coupling groove of the ring, the first floating electrode having a ring shape, wherein a top surface of the first floating electrode is exposed at the ring, and the first floating electrode has a tapered shape including an inclined surface that is inclined in a downward direction toward the electrostatic chuck.
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公开(公告)号：US20250106975A1
公开(公告)日：2025-03-27
申请号：US18738968
申请日：2024-06-10
Applicant: SAMSUNG ELECTRONICS CO., LTD.
Inventor： Donghoon PARK , Kwangyoung JUNG , Seunghun KIM , Jung-Soon BOK , Jiho UH , Hyunjoon OHN , WonHee YOON
Abstract: Provided is a plasma generating system including: a resonant inverter including a switching circuit and configured to generate a device output current and a device output voltage, and to have a switching frequency based on an input DC current and an input DC voltage; a plasma source configured to generate a plasma based on the device output current and the device output voltage; a controller configured to control the switching frequency of the resonant inverter based on a value of the input DC current, a value of the input DC voltage, a value of the device output current, and a value of the device output voltage; and a junction temperature estimator configured to: estimate a current output from the switching circuit based on the value of the input DC voltage, the value of the device output current, and the value of the device output voltage, generate an inverted current estimate value, and estimate a junction temperature of the switching circuit based on the inverted current estimate value.
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公开(公告)号：US20230296550A1
公开(公告)日：2023-09-21
申请号：US17962902
申请日：2022-10-10
Applicant: Samsung Electronics Co., Ltd.
Inventor： Sunhwan PARK , Jaeo RYU , Jungsoo SON , Kyoungok KIM , Wonhee PARK , Jiho UH , Hyunsoo CHUN
CPC classification number: G01N27/302 , G01N1/2035 , G01N2001/205
Abstract: A pH monitoring system includes a first pipe, and a second pipe and a third pipe each branched from the first pipe, a drain connected to the third pipe, a sensor module connected to the second pipe, the sensor module including an inlet valve connected to the second pipe, an outlet valve connected to the drain, and a chamber configured to receive a chemical liquid therein, and a pH sensor mountable to the sensor housing. The sensor module is disposed in parallel to the third pipe.
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