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1.发明申请公开(公告)号：US20130101926A1
公开(公告)日：2013-04-25
申请号：US13706978
申请日：2012-12-06
发明人： Il-Yong Jang , Hoon Kim , Hye-Kyoung Lee , Sang-Gyun Woo , Dong-Seok Nam
IPC分类号： G03F1/26
摘要： Halftone phase shift photomasks are provided including a substrate configured to transmit light; a shift pattern on the substrate, the shift pattern including a pattern area on a center portion of the substrate and a blind area disposed on a periphery of the substrate, the shift pattern of the blind area having a greater thickness than a thickness that of the pattern area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light. Related methods are also provided herein.
摘要翻译： 提供了半色调相移光掩模，其包括被配置为透射光的基板; 基板上的移动图案，包括基板的中心部分上的图案区域和设置在基板的周边上的盲区的移动图案，盲区的移位图案的厚度大于基板的厚度 图案区域，并且被配置为部分地透射光; 以及遮光图案，其形成在所述遮光区域中的所述移动图案上，并且被构造成屏蔽所述光。 本文还提供了相关方法。
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2.发明授权公开(公告)号：US08865375B2
公开(公告)日：2014-10-21
申请号：US13706978
申请日：2012-12-06
发明人： Il-Yong Jang , Hoon Kim , Hye-Kyoung Lee , Sang-Gyun Woo , Dong-Seok Nam
摘要： Halftone phase shift photomasks are provided including a substrate configured to transmit light; a shift pattern on the substrate, the shift pattern including a pattern area on a center portion of the substrate and a blind area disposed on a periphery of the substrate, the shift pattern of the blind area having a greater thickness than a thickness that of the pattern area, and being configured to partially transmit the light; and a light shielding pattern formed on the shift pattern in the blind area and being configured to shield the light. Related methods are also provided herein.
摘要翻译： 提供了半色调相移光掩模，其包括被配置为透射光的基板; 基板上的移动图案，包括基板的中心部分上的图案区域和设置在基板的周边上的盲区的移动图案，盲区的移位图案的厚度大于基板的厚度 图案区域，并且被配置为部分地透射光; 以及遮光图案，其形成在所述遮光区域中的所述移动图案上，并且被构造成屏蔽所述光。 本文还提供了相关方法。
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公开(公告)号：US11353413B2
公开(公告)日：2022-06-07
申请号：US17181012
申请日：2021-02-22
发明人： Hyon-Seok Song , In-Yong Kang , Il-Yong Jang
IPC分类号： G01N23/2251 , G01B15/00 , G03F7/20
摘要： Mask inspection apparatuses and/or mask inspection methods are provided that enable quick and accurate inspection of a registration of a pattern on a mask while a defect of the mask and the registration of the pattern are inspected simultaneously. The mask inspection apparatus may include a stage configured to receive a mask for inspection; an e-beam array including a plurality of e-beam irradiators configured to irradiate e-beams to the mask and detectors configured to detect electrons emitted from the mask; and a processor configured to process signals from the detectors. A defect of the mask may be detected through processing of the signal and registrations of patterns on the mask may be inspected based on positional information regarding the e-beam irradiators.
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公开(公告)号：US10955369B2
公开(公告)日：2021-03-23
申请号：US16437468
申请日：2019-06-11
发明人： Hyon-Seok Song , In-Yong Kang , Il-Yong Jang
IPC分类号： G01N23/2251 , G01B15/00 , G03F7/20
摘要： Mask inspection apparatuses and/or mask inspection methods are provided that enable quick and accurate inspection of a registration of a pattern on a mask while a defect of the mask and the registration of the pattern are inspected simultaneously. The mask inspection apparatus may include a stage configured to receive a mask for inspection; an e-beam array including a plurality of e-beam irradiators configured to irradiate e-beams to the mask and detectors configured to detect electrons emitted from the mask; and a processor configured to process signals from the detectors. A defect of the mask may be detected through processing of the signal and registrations of patterns on the mask may be inspected based on positional information regarding the e-beam irradiators.
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5.发明申请公开(公告)号：US20200150062A1
公开(公告)日：2020-05-14
申请号：US16437468
申请日：2019-06-11
发明人： HYON-SEOK SONG , In-Yong Kang , Il-Yong Jang
IPC分类号： G01N23/2251 , G01B15/00 , G03F7/20
摘要： Mask inspection apparatuses and/or mask inspection methods are provided that enable quick and accurate inspection of a registration of a pattern on a mask while a defect of the mask and the registration of the pattern are inspected simultaneously. The mask inspection apparatus may include a stage configured to receive a mask for inspection; an e-beam array including a plurality of e-beam irradiators configured to irradiate e-beams to the mask and detectors configured to detect electrons emitted from the mask; and a processor configured to process signals from the detectors. A defect of the mask may be detected through processing of the signal and registrations of patterns on the mask may be inspected based on positional information regarding the e-beam irradiators.
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公开(公告)号：US09989860B2
公开(公告)日：2018-06-05
申请号：US15255925
申请日：2016-09-02
发明人： Sang-Hee Lee , Hyun-Seok Uhm , Il-Yong Jang
摘要： A pattern generating method includes, generating a first bit map from inputted pattern data. Characteristics of a plurality of beams for exposing a pattern on a substrate are analyzed, each of the plurality of beams being designated to correspond to one of a plurality of grids in the first bit map. The pattern data is corrected such that at least one of the plurality of beams is designated to expose at least a portion of the pattern on the substrate. A second bit map is generated from the corrected pattern data. The substrate is patterned using the plurality of beams according to the designation of the second bit map.
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