CHEMICAL LIQUID SUPPLY APPARATUS AND SEMICONDUCTOR PROCESSING APPARATUS HAVING THE SAME
    1.
    发明申请
    CHEMICAL LIQUID SUPPLY APPARATUS AND SEMICONDUCTOR PROCESSING APPARATUS HAVING THE SAME 审中-公开
    化学液体供应设备及其半导体加工设备

    公开(公告)号:US20170062242A1

    公开(公告)日:2017-03-02

    申请号:US15172740

    申请日:2016-06-03

    CPC classification number: H01L21/6708 H01L21/67017

    Abstract: A chemical liquid supply apparatus includes a nozzle unit including a nozzle arm and an injection nozzle mounted in an end of the nozzle arm, a chemical liquid supply unit including a first chemical liquid tank accommodating a first chemical liquid and a second chemical liquid tank accommodating a second chemical liquid, and supplying the first chemical liquid and the second chemical liquid to the nozzle unit, and a mixer unit provided in the nozzle unit and discharging a process fluid by mixing the first chemical liquid and the second chemical liquid, wherein the mixer unit includes an in-line mixer mixing the first chemical liquid and the second chemical liquid that are continually injected from the chemical liquid supply unit, and a mixer pipe extending from the in-line mixer to the injection nozzle.

    Abstract translation: 一种药液供给装置包括:喷嘴单元,包括喷嘴臂和安装在喷嘴臂的端部的喷嘴;药液供给单元,包括容纳第一药液的第一药液槽和容纳第一药液的第二药液箱, 第二化学液体,并且将第一化学液体和第二化学液体供给到喷嘴单元;以及混合器单元,其设置在喷嘴单元中,并且通过混合第一化学液体和第二化学液体来排出处理流体,其中混合器单元 包括混合从化学液体供应单元连续注入的第一化学液体和第二化学液体的串联混合器,以及从在线混合器延伸到喷嘴的混合管。

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